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pp.629-633
This study examined the effect of growth temperature on the electrical and optical properties ofhydrogenated Al-doped zinc oxide (AZO:H) thin films deposited by rf magnetron sputtering using a ceramictarget (98wt.% ZnO, 2wt.% Al2O3). Various AZO films on glass were prepared by changing the substratetemperature from room temperature to 200oC. It was shown that intentionally incorporated hydrogen plays animportant role on the electrical properties of AZO:H films by increasing free carrier concentration. As a result,in the 2% H2 addition at the growth temperature of 150oC, resistivity of 3.21×10-4Ω·cm, mobility of 21.9cm2/V−s, electric charge carrier concentration of 9.35×1020cm-3 was obtained. The AZO:H films show a hexagonalwurtzite structure preferentially oriented in the (002) crystallographic direction.
