In this study, TbDyFe thin films with the thickness of 1000 Å are fabricated by DC magnetron sputtering. TbDyFe thin films are prepared by DC magnetron sputtering method. The pressure of Ar gas below 1.33 kPa and DC input power of 200 W are used for the sputtering conditions. During sputtering process the substrate holder is heated up to 150 ℃. The thin films are deposited to a thickness of 1000 Å on polyimide substrate with a thickness of 2 μm. The fabricated microstructures are observed by X-ray diffraction (XRD) and the film thickness is measured. Magnetostrictions are determined from the curvature of the thin films which are measured by the optical cantilever method. The experimental results are discussed with numerical data.

• 이흥식(Joongbu University) | H. S. Lee
• 정태훈(Joongbu University) | T. H. Chung Corresponding Author