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반도체 포토공정에서 총 작업흐름시간을 최소화하기위한 스케쥴링 방법론에 관한 연구

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  • URLhttps://db.koreascholar.com/Article/Detail/352962
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한국산업경영시스템학회 (Society of Korea Industrial and Systems Engineering)
초록

This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility. and sequence-dependent recipe set up times may be required at the photolithography machines. In addition. a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms. in which developed machine selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.

목차
Abstract
 1. 서론 
 2. 문제정의 
 3. 휴리스틱 알고리듬
 4. 실험(Computational experiments) 
 5. 결론 
 7. 참고문헌
저자
  • 최성우(경기대학교)
  • 이규배(경기대학교)