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        검색결과 4

        1.
        2018.05 KCI 등재 SCOPUS 구독 인증기관 무료, 개인회원 유료
        A boron-doped diamond(BDD) electrode is attractive for many electrochemical applications due to its distinctive properties: an extremely wide potential window in aqueous and non-aqueous electrolytes, a very low and stable background current and a high resistance to surface fouling. An Ar gas mixture of H2, CH4 and trimethylboron (TMB, 0.1 % C3H9B in H2) is used in a hot filament chemical vapor deposition(HFCVD) reactor. The effect of argon addition on quality, structure and electrochemical property is investigated by scanning electron microscope(SEM), X-ray diffraction(XRD) and cyclic voltammetry(CV). In this study, BDD electrodes are manufactured using different Ar/CH4 ratios (Ar/CH4 = 0, 1, 2 and 4). The results of this study show that the diamond grain size decreases with increasing Ar/CH4 ratios. On the other hand, the samples with an Ar/CH4 ratio above 5 fail to produce a BDD electrode. In addition, the BDD electrodes manufactured by introducing different Ar/CH4 ratios result in the most inclined to (111) preferential growth when the Ar/CH4 ratio is 2. It is also noted that the electrochemical properties of the BDD electrode improve with the process of adding argon.
        4,000원
        2.
        2017.03 KCI 등재 SCOPUS 구독 인증기관 무료, 개인회원 유료
        Boron-doped diamond (BDD) electrode has an extremely wide potential window in aqueous and non-aqueous electrolytes, very low and stable background current and high resistance to surface fouling due to weak adsorption. These features endow the BDD electrode with potentially wide electrochemical applications, in such areas as wastewater treatment, electrosynthesis and electrochemical sensors. In this study, the characteristics of the BDD electrode were examined by scanning electron microscopy (SEM) and evaluated by accelerated life test. The effects of manufacturing conditions on the BDD electrode were determined and remedies for negative effects were noted in order to improve the electrode lifetime in wastewater treatment. The lifetime of the BDD electrode was influenced by manufacturing conditions, such as surface roughness, seeding method and rate of introduction of gases into the reaction chamber. The results of this study showed that BDD electrodes manufactured using sanding media of different sizes resulted in the most effective electrode lifetime when the particle size of alumina used was from 75~106 μm (#150). Ultrasonic treatment was found to be more effective than polishing treatment in the test of seeding processes. In addition to this, BDD electrodes manufactured by introducing gases at different rates resulted in the most effective electrode lifetime when the introduced gas had a composition of hydrogen gas 94.5 vol.% carbon source gas 1.6 vol.% and boron source gas 3.9 vol.%.
        4,000원
        4.
        2010.09 KCI 등재 서비스 종료(열람 제한)
        The purpose of this study is to degradation of Rhodamine B (RhB, dye) and N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the electro-generation of OH radical) in solution using boron doped diamond (BDD) electrode. The effects of applied current (0.2~1.0 A), electrolyte type (NaCl, KCl, and Na2SO4) and electrolyte concentration (0.5~3.0 g/L), solution pH (3~11) and air flow rate (0~4 L/min) were evaluated. Experimental results showed that RhB and RNO removal tendencies appeared with the almost similar thing, except of current. Optimum current for RhB degradation was 0.6 A, however, RNO degradations was increased with increase of applied current. The RhB and RNO degradation of Cl type electrolyte were higher than that of the sulfate type. The RhB and RNO degradation were increased with increase of NaCl concentration and optimum NaCl dosage was 2.5 g/L. The RhB and RNO concentrations were not influenced by pH under pH 7. Optimum air flow rate for the oxidants generation and RhB and RNO degradation were 2 L/min. Initial removal rate of electrolysis process was expressed Langmuir - Hinshelwood equation, which is used to express the initial removal rate of UV/TiO2 process.