This study demonstrates a different approach method to fabricate antimony selenide (Sb2Se3) thin-films for the solar cell applications. As-deposited Sb2Se3 thin-films are fabricated via electrodeposition route and, subsequently, annealed in the temperature range of 230 ~ 310oC. Cyclic voltammetry is performed to investigate the electrochemical behavior of the Sb and Se ions. The deposition potential of the Sb2Se3 thin films is determined to be -0.6 V vs. Ag/AgCl (in 1 M KCl), where the stoichiometric composition of Sb2Se3 appeared. It is found that the crystal orientations of Sb2Se3 thin-films are largely dependent on the annealing temperature. At an annealing temperature of 250 oC, the Sb2Se3 thin-film grew most along the c-axis [(211) and/or (221)] direction, which resulted in the smooth movement of carriers, thereby increasing the carrier collection probability. Therefore, the solar cell using Sb2Se3 thin-film annealed at 250 oC exhibited significant enhancement in JSC of 10.03 mA/cm2 and a highest conversion efficiency of 0.821 % because of the preferred orientation of the Sb2Se3 thin film.

Diamond-like nanocomposite (DLN) has become a promising thin film for many fields of applications due to its unique and tunable properties. However, low optical bandgap and thermal stability limits its application in many fields particularly as antireflection coating on solar cell. In the present study, the DLN thin film has been deposited using a mixed liquid precursor by rf-PECVD process. Surprisingly the presence of nc-C60 in FCC structure in DLN matrix has been observed. The degree of crystallinity and diameter of C60 have been increased significantly after annealed at 850 °C. The film has been annealed at 850 °C to primarily investigate its feasibility as antireflection coating (ARC) in compatible with industrial solar cell fabrication process. The refractive index and optical bandgap of the film were around 1.80 and 4.10 eV, respectively. Moreover, the optical bandgap has decreased to some extent to 3.92 eV even after annealing at such high temperature. The high SiOx at% and embedded nc-C60 enhanced the optical transparency and thermal stability of the DLN film. The solar-weighted average reflection of DLN-coated textured silicon was reduced significantly to 1.91%. The C60 embedded DLN film has a great potential to apply in different optoelectronic devices especially in solar cell as ARC.

A 1.8 μm thick polycrystalline diamond (PCD) thin film layer is prepared on a Si(100) substrate using hot-filament chemical vapor deposition. Thereafter, its thermal conductivity is measured using the conventional laser flash analysis (LFA) method, a LaserPIT-M2 instrument, and the newly proposed light source thermal analysis (LSTA) method. The LSTA method measures the thermal conductivity of the prepared PCD thin film layer using an ultraviolet (UV) lamp with a wavelength of 395 nm as the heat source and a thermocouple installed at a specific distance. In addition, the microstructure and quality of the prepared PCD thin films are evaluated using an optical microscope, a field emission scanning electron microscope, and a micro-Raman spectroscope. The LFA, LaserPIT-M2, and LSTA determine the thermal conductivities of the PCD thin films, which are 1.7, 1430, and 213.43 W/(m·K), respectively, indicating that the LFA method and LaserPIT-M2 are prone to errors. Considering the grain size of PCD, we conclude that the LSTA method is the most reliable one for determining the thermal conductivity of the fabricated PCD thin film layers. Therefore, the proposed LSTA method presents significant potential for the accurate and reliable measurement of the thermal conductivity of PCD thin films.

휘어지며 투명한 전자기기의 개발을 위해서 최근 유기반도체, 탄소기반 나노소재, 금속산화물 반도체등의 다양한 신소재 반도체 개발에 대한 연구가 관심을 받으며 지속적으로 발전하고 있다. 그러나, 이러한 신소재 반도체 기술의 꾸준하고 지속적인 발전에도 불구하고 트랜지스터를 구성하는 주요 소재중 하나인 유전체에 대한 연구는 반도체의 개발속도에 크게 미치지 못하여, 기계적인 휘어짐의 특성을 갖추고, 높은 캐패시턴스와 좋은 누전전류 특성을 갖는 새로운 유전체 개발에 대한 요구가 지속적으로 커지고 있다. 이에 본 연구는 저전압에서 구동 가능한 박막트랜지스터를 위한 유기-무기 하이브리드소재 박막을 개발하며 이를 저전압 구동이 가능한 유기박막트랜지스터에 적용하였다. 상대적으로 높은 유전상수를 갖는 염화하프늄 (HfO2)과 소수성기를 갖고 있으며 금속산화물과 공유결합이 가능한 실란산 기반의 유기물 (octadecyltrimethoxysilane)을 혼합한 전구체 용액을 합성하며 상대적으로 낮은 온도에서 열처리를 통해 얻을 수 있었다. 제조된 하이브리드 게이트 유전체 박막은 우수한 절연 및 유전체 특성과 함께 소수성 표면 특성을 가질 수 있었고 펜타센 유기박막트랜지스터로 응용하여 저전압에서 구동이 되며 우수한 트랜지스터 성능을 갖는 소자를 개발하였다.

연구에서는 새로 설계한 고분자 절연체 위에 전자 주개(Donor)-받개(Acceptor) 기반의 반도체성 공중합체인 Cyclopentadithiophene-alt-benzothiadiazole (CDT-BTZ)를 활성 반도체층으로 형성하여 제작한 고분자 반도체 전계효과 트랜지스터의 전기적 특성을 살펴보았다. 이 연구에서 제시하는 고분자 절연체 박막은 내열성과 전기절연성이 우수한 포스파젠과 멜리민 구조가 가교된 형태를 가지기 때문에 0.006 nm의 매우 평탄한 RMS 표면 거칠기를 가졌으며, 4.5 MV/cm 이상의 매우 우수한 절연강도와 1.55의 다소 낮은 유전 상수를 가진 것으로 측정되었다. 그리고, 고분자 절연 막과 계면을 이루는 CDT-BTZ D-A 타입 반도체성 공중합체 박막은 2.0 x 10-3 cm2/Vs의 선형영역 이동도와 1.0 x 10-3 cm2/Vs의 포화영역 이동도를 갖는 것으로 측정되었다. 이를 통해, 고분자 절연체 위에 형성된 CDT-BTZ 고분자 반도체 박막은 유연 전자회로의 스위칭 소자로 쓰이기에 충분한 잠재성이 있다고 여겨진다.

Using UV nanoimprint lithography(UV-NIL), 1-dimensional(1-D) pattern structures were fabricated on a hybrid mixture thin film of lanthanum oxide and a UV-curable resin. 1-D pattern on a wafer fabricated by the laser interference lithography was transferred to polydimethylsiloxane and this is used as a mold of UV-NIL process. Conducting an X-ray photoelectron spectroscopy, C 1s and La 3d spectra were analyzed, and it was confirmed that hybrid thin film was successfully deposited on glass substrate. Also, transferred pattern structure was observed by using an atomic force microscopy. Through this, it was revealed that agglomerations between 1-D pattern were increased as UV irradiation time increased and this phenomenon disrupted the quality of NIL process. Additionally, liquid crystal(LC) cells with patterned hybrid thin films were fabricated and LC alignment performances were investigated. Using the polarizing optical microscopy and the crystal rotation method, LC alignment state and pretilt angles were observed. Consequently, the uniform homogeneous LC alignment was achieved at UV irradiation time of 1min and 3min where high resolution pattern transfer was observed.