The time series data of rotifer community focusing on the species number and total density were collected from 29 reservoirs located at Jeonnam Province from 2008 to 2016 quarterly. The reservoirs had similar weather condition during the study period, but their sizes and water qualities were different. To analyze the temporal dynamics of rotifer community, the medians, ranges, outliers and coefficient of variation (CV) value of rotifer species number and abundance were compared. For the temporal trend analysis, time series of each reservoir data were compared and clustered using the dynamic time warping function of the R package “dtwclust”. Small-sized reservoirs showed higher variability in rotifer abundance with more frequent outliers than large-sized reservoirs. On the other hand, apparent pattern was not observed for the rotifer species number. For the temporal pattern of rotifer density, COD, phytoplankton abundance fluctuation, and cladoceran abundance fluctuation have been suggested as potential factor affecting the rotifer abundance dynamics.

We demonstrate a simple and effective method to accurately position silicon nanowires (Si NWs) at desirable locations using drop-casting of Si NW inks; this process is suitable for applications in nanoelectronics or nanophotonics. Si NWs were assembled into a lithographically patterned sacrificial photoresist (PR) template by means of capillary interactions at the solution interface. In this process, we varied the type of solvent of the SiNW-containing solution to investigate different assembly behaviors of Si NWs in different solvents. It was found that the assembly of Si NWs was strongly dependent on the surface energy of the solvents, which leads to different evaporation modes of the Si NW solution. After Si NW assembly, the PR template was cleanly removed by thermal decomposition or chemical dissolution and the Si NWs were transferred onto the underlying substrate, preserving its position without any damage. This method enables the precise control necessary to produce highly integrated NW assemblies on all length scales since assembly template is easily fabricated with top-down lithography and removed in a simple process after bottom-up drop-casting of NWs.