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pp.148-153
Electron transfer through an Langmuir-Blodgett(LB) monolayer film sandwiched between metal electrodes. We used an eicosanoic acid material and the material was very famous as a thin film insulating material. Eicosanoic acid monolayer was deposited by Langmuir-Blodgett(LB) technique and a subphase was a CdCl2 solution as a 2×10-4 mol/L. Also we used a bottom electrode as an Al/Al2O3 and a top electrode as a Al and Ti/Al. Here, the Al2O3 on the bottom electrode was deposited by thermal evaporation method. The Al2O3 layer was acted on a tunneling barrier and insulating layer in tunnel diode. It was found that the proper transfer surface pressure for film deposition was 25 mN/m and the limiting area per molecule was about 24 a2/molecule. When the positive and negative bias applied to the molecular device, the behavior shows that a tunnel switching characteristics. This result were analyzed regarding various mechanisms.
