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pp.1-6
Nitrogen trifluoride (NF3) and Sulfur hexafluoride (SF6) are usually used as novel etching and cleaning gases in semiconductor industry and electrical equipments. Recently, the many studies about PFCs decomposition have been performed due to high global warming potential (GWP). This study is to identify the effects of the hydrogen on the destruction and removal efficiency (DRE) of NF3 and SF6 when using the electron-beam. The experiment was conducted at a flow rate of 10 LPM with NF3 and SF6 of 1,000 ppm. Absorbed dose (electric current) was 1,028 kGy (5 mA). The DREs of NF3 and SF6 gases increased about 54% and 68% respectively with hydrogen injection. By-products formed by NF3 and SF6 destruction were mainly HF and F2 gases. In addition, the particles were generated during the NF3 and SF6 destruction due to corrosion of reactor and SF6 decomposion, respectively.
