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나노 구체 리소그라피법에 Ashing과 Annealing 효과를 적용하여 크기조절 가능한 나노패턴의 제조 KCI 등재 SCOPUS

Size Tunable Nano Patterns Using Nanosphere Lithography with Ashing and Annealing Effect

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  • URLhttps://db.koreascholar.com/Article/Detail/297135
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한국재료학회지 (Korean Journal of Materials Research)
한국재료학회 (Materials Research Society Of Korea)
초록

This work presents a fabrication procedure to make large-area, size-tunable, periodically different shape metal arrays using nanosphere lithography (NSL) combined with ashing and annealing. A polystyrene (PS, 580 μm) monolayer, which was used as a mask, was obtained with a mixed solution of PS in methanol by multi-step spin coating. The mask morphology was changed by oxygen RIE (Reactive Ion Etching) ashing and temperature processing by microwave heating. The Au or Pt deposition resulted in size tunable nano patterns with different morphologies such as hole and dots. These processes allow outstanding control of the size and morphology of the particles. Various sizes of hole patterns were obtained by reducing the size of the PS sphere through the ashing process, and by increasing the size of the PS sphere through annealing treatment, which resulted in tcontrolling the size of the metallic nanoparticles from 30 nm to 230 nm.

저자
  • 이유림 | Lee, Yu-Rim
  • 마흐붑 알람 | 마흐붑 알람
  • 김진열 | 김진열
  • 정우광 | 정우광
  • 김승대 | 김승대