In recent models of semiconductor manufacturing clean rooms, air washers are used to remove airborne gaseous contaminants such as NH3, SOx and organic gases introduced from outdoor air into clean room. Meanwhile, there is a large quantity of exhaust air produced from clean room. It is desirable to recover heat from exhaust air and use it to reheat outdoor air. In the present study, an experiment was conducted to investigate heat recovery, particle collection, and gas removal in a heat recovery type air washer system for semiconductor manufacturing clean rooms.

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