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플라즈마 이용 반도체 공정의 과불화화합물(NF3, CF4, SF6) 분해 연구 KCI 등재

A Study on Decomposition of Perfluorocompounds (NF3, CF4, SF6) Emitted from Semiconductor Process using Plasma

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한국폐기물자원순환학회지 (Journal of Korea Society of Waste Management)
한국폐기물자원순환학회 (Korea Society Of Waste Management)
초록

PFC (perfluorocompound) gases have an extremely high global warming potential (GWP). A study of the destruction of NF3, CF4 and SF6 gases emitted from the semiconductor industry was attempted by plasma power at 4.4 kW, 5.5 kW, 6.0 kW, 6.6 kW, 7.6 kW, 8.1 kW and 9.1 kW. As electric power increased, DRE (destruction and removal efficiency) of NF3, CF4 and SF6 was also increased. It was confirmed through experiment that the DRE of NF3 is 99% at 7.6 kW, 97% for CF4 at 9.14 kW and 100% for SF6 at 7.6 kW of plasma power. By-products formed by PFC destruction were mainly F2, SO2F2, NOx and CO gases. In addition, particulate matter was formed, and particle were proven to be AlF3.

목차
Abstract
 I. 서 론
 II. 실험방법
  1. 실험장치 구성
  2. 실험 및 분석방법
 III. 결과 및 고찰
  1. PFCs DRE
  2. PFCs의 가스상 부산물
  3. PFCs의 입자상 부산물
 IV. 결 론
 References
저자
  • 류재용(경남대학교 환경에너지공학과) | Jae-Yong Ryu (Department of Environment and Energy Engineering, Kyungnam University) Corresponding Author