A Study on Decomposition of Perfluorocompounds (NF3, CF4, SF6) Emitted from Semiconductor Process using Plasma
PFC (perfluorocompound) gases have an extremely high global warming potential (GWP). A study of the destruction of NF3, CF4 and SF6 gases emitted from the semiconductor industry was attempted by plasma power at 4.4 kW, 5.5 kW, 6.0 kW, 6.6 kW, 7.6 kW, 8.1 kW and 9.1 kW. As electric power increased, DRE (destruction and removal efficiency) of NF3, CF4 and SF6 was also increased. It was confirmed through experiment that the DRE of NF3 is 99% at 7.6 kW, 97% for CF4 at 9.14 kW and 100% for SF6 at 7.6 kW of plasma power. By-products formed by PFC destruction were mainly F2, SO2F2, NOx and CO gases. In addition, particulate matter was formed, and particle were proven to be AlF3.