논문 상세보기

Large-Area Photosensitive Glass Tilting Processing Using UV Laser

UV 레이저를 이용한 대면적 감광유리 각도가공

  • 언어ENG
  • URLhttps://db.koreascholar.com/Article/Detail/353608
모든 회원에게 무료로 제공됩니다.
한국산업경영시스템학회 (Society of Korea Industrial and Systems Engineering)
초록

When taking X-ray, Some of them are not only absorbed as they pass through the body, but some are scattered and blurred. To prevent this problem, 'X-Ray Grid' was placed between the body and the film. Conventionally, in order to manufacture an X-ray grid, a lead sheet and an aluminum sheet were adhered with epoxy or the like, cut to a predetermined thickness, and formed in a line at a predetermined angle. New grids are actively being developed to solve this problem. In this study, Laser beam was irradiated on a photosensitive glass having high X-ray transmittance to form an oblique lattice type channel. When the photosensitive glass is exposed to Laser beam, Previous studies have shown that laser exposure to photosensitive glass reacts with UV-Laserto form high-precision microstructures. The photosensitive glass exposed by the laser is heat-treated at a high temperature to crystallize the exposed part. When the crystallized patterns are etched with a hydrofluoric acid liquid solution, a structure having a depth is completed. The completed structure is filled with metals with X-ray shielding properties. The angle of incidence can be processed up to 18, which is the angle of incidence of ordinary X-ray, The upper surface line width of theetched pattern is 20um or less and The depth of processing after etching was found to be more than 100um, which means 'the filler can be deposited sufficiently'.

저자
  • 김용대(한밭대학교 산업경영공학과, Dept. of Industrial and Management Engineering, Hanbat National University) | Yong Dae Kim
  • 민병찬(한밭대학교 산업경영공학과, Dept. of Industrial and Management Engineering, Hanbat National University) | Byung Chan Min
  • 이제훈(한국기계연구원 광응용기계연구실, Dept. of Laser & Electron Beam Application, KIMM) | Jae hoon Lee
  • 신동식(한국기계연구원 광응용기계연구실, Dept. of Laser & Electron Beam Application, KIMM) | Dong Sig Shin