Ti has received considerable attention for aerospace, vehicle, and semiconductor industry applications because of its acid-resistant nature, low density, and high mechanical strength. A common precursor used for preparing Ti materials is TiCl4. To prepare high-purity TiCl4, a process based on the removal of VOCl3 has been widely applied. However, VOCl3 removal by distillation and condensation is difficult because of the similar physical properties of TiCl4 and VOCl3. To circumvent this problem, in this study, we have developed a process for VOCl3 removal using Cu powder and mineral oil as purifying agents. The effects of reaction time and temperature, and ratio of purifying agents on the VOCl3 removal efficiency are investigated by chemical and structural measurements. Clear TiCl4 is obtained after the removal of VOCl3. Notably, complete removal of VOCl3 is achieved with 2.0 wt% of mineral oil. Moreover, the refined TiCl4 is used as a precursor for the synthesis of Ti powder. Ti powder is fabricated by a thermal reduction process at 1,100oC using an H2-Ar gas mixture. The average size of the Ti powder particles is in the range of 1-3 μm.