This work reports the fabrication of a flexible Photodetector (PD) using Carbon Dots (CDs)/Polymer composite for Deep UV (DUV) photodetection. The CDs have been prepared using a simple and inexpensive heating process. The syncretic studies reveal the disordered graphitic core with surface functional groups and the excitation-dependent character of CDs. The synthesized CDs are stabilized via Poly Vinyl Alcohol (PVA) through a synergistic effect and investigated for different compositions (2–10 weight %) of CDs. The CDs/PVA composites shows improved absorbance at 208 and 335 nm compared to pure CDs owing to the bonding between them. This advantageous property of high absorption and photo response in the DUV region is utilized by employing CDs/PVA composite as a photo-sensing layer on the ITO-coated PET substrate in the PD. The performance of the PD was measured under dark, short (254 nm) and long (365 nm) UV region. Among all the compositions, 4% CDs/PVA PD exhibits superior performance in terms of high photo-to-dark current ratio (IPh/Id), responsivity and detectivity. The PD functioning and other parameters are discussed in detail and reported.

We report the structural characterization and electric heating performance of carbon thin films (CTFs), which were prepared from negative-type SU-8 photoresist by deep UV exposure and following carbonization. The prepared CTFs were found to have pseudo-graphitic carbon structures containing partially graphite domains in the amorphous carbon matrix. The CTFs showed a very smooth surface morphology with a roughness of 0.42 nm. The 107 nm-thick CTFs exhibited an excellent electric heating performance by attaining a high maximal temperature of 207 °C and a rapid heating rate of 13.2 °C/s at an applied voltage of 30 V. Therefore, the CTFs prepared in this study can be applied as electrode materials for high-performance electric heaters.

A new class of deep UV Photoresist based on the principles of chemical amplification was developed. This photoresist consists of three basic elements: a copolymer, blocked tetrabromobisphenol-A as a dissolution inhibitor and a photosensitive onium salt as a photoacid generator. On irradiation followed by a post exposure bake, tert-butoxycarbonyloxy phenyl group is converted to phenol group. Thus the initially base insoluble resin is converted under UV irradiation to a base soluble resin which may be preferentially removed by dissolution. This new photoresist display high sensitivity, 10 mJ/cm2.