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NDAS 유도체의 합성과 감광특성 KCI 등재

Synthesis and Photosensitive Characterization of NDAS Derivatives

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  • URLhttps://db.koreascholar.com/Article/Detail/257134
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한국응용과학기술학회지 (The Korean Society of Applied Science and Technology)
한국응용과학기술학회(구 한국유화학회) (The Korean Society of Applied Science and Technology (KSAST))
초록

Naphthoquinone-1,2-diazide-5-sulfonyl[NDAS] derivatives members of quinone diazide compound that are utilizable as photosensitive polymer material were synthesized, and photoresist were prepared by mixing these derivatives with m-cresol novolak(a matrix resin) at various weight ratios. Photosensitive characteristics of photoresist were studied by examining UV and IR, relative sensitivity using a Gray scale method, and SEM to analyze if they can be used as photosensitive material in printing process. Experimental results showed that, by UV, NDAS derivatives were photoconverted and developer-soluble photoresist were produced. The mixing ratio of 1:4(by mass) of NDAS+p-ydroxybenzophenone+sensitizer and m-cresol novolak gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity and contrast.

저자
  • 이기창 | Lee, Ki-Chang
  • 최성용 | Choi, Sung-Yong
  • 배남경 | Bae, Nam-Kyoung
  • 윤철훈 | Yoon, Cheol-Hun
  • 황성규 | Hwang, Sung-Kwy