Polydimethylsiloxane(PDMS) 몰드를 이용하여 Thermal Imprinting 방법을 통해 광변색 물질인Nitrospirobenzopyran(NSB)를 포함하는 Polystyrene 박막을 패터닝하였다. 패턴된 광변색 소자의 변색 및 탈색에 따른 흡광도 스펙트럼 및 회절효과를 조사된 자외선량에 따라 측정하여 자외선 조사량에따른 회절 효율 변화를 식으로 근사할 수 있었으며 회절 효율로부터 소자의 굴절률 변화량을 계산해 낼 수 있었다. 변색 전 회절효율은 6.75%, 공기와의 굴절률 차이 값은 0.078였으며, 200J/m2의 자외선량이조사된 후의 회절효율은 7.56%, 공기와의 굴절률 차이 값은 0.083로 나타났다. 광변색 패턴의 자외선에의한 회절효율의 변화는 자외선 감지에 효과적인 것으로 나타났다.
Polystyrene film containing photochromic nitrospirobenzopyran(NSB) was patterned by the thermal imprinting method using a pre-patterned polydimethylsiloxane(PDMS) mold. Using photochromic patterned cell, diffraction efficiency(DE) and absorbance spectrum depending on ultraviolet light(UV) dose were obtained. The relationship between DE and UV dose were obtained also, and refractive index difference between patterned material and air were determined from the relationship. The refractive index difference between the polymer grating and medium was determined as 0.078 to 0.083, DE change was determined as 6.75% to7.56% from the irradiated UV dose at 0 to200J/m2, respectively. Thus such a large DE change by UV irradiation was found to be very effective for UV sensing.