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Effect of Processing Parameters on the Formation of Large Area Self-Assembled Monolayer of Polystyrene Beads by a Convective Self-Assembly Method

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한국재료학회지 (Korean Journal of Materials Research)
한국재료학회 (Materials Research Society Of Korea)
초록

Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

목차
1. 서 론
2. 이론적 배경
3. 실험 방법
4. 결과 및 고찰
5. 결 론
Acknowledgement
References
저자
  • 서안나(한국과학기술연구원 전자재료연구단) | Ahn-na Seo
  • 최지환(고려대학교 신소재공학과) | Ji-Hwan Choi
  • 변재철(연세대학교 신소재공학과) | Jae-chul Pyun
  • 김원목(한국과학기술연구원 전자재료연구단) | Won Mok Kim
  • 김인호(한국과학기술연구원 전자재료연구단) | Inho Kim
  • 이경석(한국과학기술연구원 전자재료연구단, 과학기술연합대학원 나노재료공학과) | Kyeong-Seok Lee Corresponding author