Si3N4 is a ceramic material attracting attention in many fields because of its excellent abrasion resistance. In addition, Ti and TiAl alloys are metals used in a variety of high temperature environments, and have attracted much attention because of their high strength and high melting points. Therefore, study of the interface reaction between Si3N4 / Ti and Si3N4 / TiAl can be a useful practice to identify phase selection and diffusion control. In this study, Si3N4 / Ti5Si3 + TiN / TiN / Ti diffusing pairs were formed in the Si3N4 / Ti interfacial reaction and Si3N4 / TiN(Al) / Ti3Al / TiAl diffusion pathway was identified in the Si3N4 / TiAl interfacial reaction. The diffusion layers of the interface reactions were identified and, to investigate the kinetics of the diffusion layer, the integrated diffusion coefficients were estimated.

• 최광수(한밭대학교 신소재공학과) | Kwang Su Choi (Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea)
• 김선진(한밭대학교 신소재공학과) | Sun Jin Kim (Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea)
• 이지은(한밭대학교 신소재공학과) | Ji Eun Lee (Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea)
• 박준식(한밭대학교 신소재공학과) | Joon Sik Park (Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea) Corresponding author
• 이종원(한밭대학교 신소재공학과) | Jong Won Lee (Department of Materials Science and Engineering, Hanbat National University, Daejeon 34158, Republic of Korea) Corresponding author