The reactivity evaluation of copper is performed using ethylenediamine, aminoethanol, and piperidine to apply organic chelators to copper etching. It is revealed that piperidine, which is a ring-type chelator, has the lowest reactivity on copper and copper oxide and ethylenediamine, which is a chain-type chelator, has the highest reactivity via inductively coupled plasma-mass spectroscopy (ICP-MS). Furthermore, it is confirmed that the stable complex of copper-ethylenediamine can be formed during the reaction between copper and ethylenediamine using nuclear magnetic resonance (NMR) and radio-thin layer chromatography. As a final evaluation, the copper reactivity is evaluated by wet etching using each solution. Scanning electron micrographs reveal that the degree of copper reaction in ethylenediamine is stronger than that in any other chelator. This result is in good agreement with the evaluation results obtained by ICP-MS and NMR. It is concluded that ethylenediamine is a prospective etch gas for the dry etching of the copper.

Abstract
1. 서 론
2. 실험 방법
    2.1. 구리 금속 친화도 평가 실험(Fig. 2)
    2.2. 구리 금속 또는 산화구리 친화도 평가 실험(Fig. 3)
    2.3. Nuclear magnetic resonance (NMR) 및 radiothinlayer chromatograph (radio-TLC) scanner을 이용한 구리이온의 친화도 평가 실험
    2.4. Cu TEM grid를 사용한 유기 킬레이터의 습식 식각 평가 실험
3. 결과 및 고찰
4.결 론
References

• 김철희(인하대학교 화학과) | Chul Hee Kim (Department of Chemistry, Inha University)
• 임은택(인하대학교 화학공학과) | Eun Taek Lim (Department of Chemical Engineering, Inha University)
• 박찬호(인하대학교 화학과) | Chan Ho Park (Department of Chemistry, Inha University)
• 박성용(인하대학교 화학공학과) | Sung Yong Park (Department of Chemical Engineering, Inha University)
• 이지수(인하대학교 화학공학과) | Ji Soo Lee (Department of Chemical Engineering, Inha University)
• 정지원(인하대학교 화학공학과) | Chee Won Chung (Department of Chemical Engineering, Inha University) Corresponding author
• 김동욱(인하대학교 화학과) | Dong Wook Kim (Department of Chemistry, Inha University) Corresponding author