Phytoplankton community is one of the important factors for the management of aquatic environment due to generation of varying toxins by harmful algal species. This study was performed to examine the phytoplankton community structure (PCS) in the midstream of Geum River (GR) from January 2014 to December 2015. The water sampling was performed in five stations on 2014, and three stations on 2015. Subsequently, the morphological identification was performed by microscopic observation in laboratory condition. As results, total 265 species were identified and it was comprised of 40.8% of Bacillariophyceae, 9.1% of Cyanophyceae, 44.5% of Chlorophyceae, and the others (4.9%). During the investigation period, total average standing crop of phytoplankton was 12,948 cells mL-1, and it was comprised of 7,702 cells mL-1 of Bacillariophyceae, 2,821 cells mL-1 of Cyanophyceae, 2,121 cells mL-1 of Chlorophyceae, and 305 cells mL-1 of others. To verify which tributaries of upstream area influence on PCS of midstream of GR, the phytoplankton standing crops of two stations including Mihocheon (MH) and Gapcheon (GC) were examined on 2014, and compared to result of on 2015. The results were shown that the MH station had more similar phytoplankton standing crops with midstream of GR than GC station. The relationship between environmental parameters and phytoplankton dynamics was studied at the investigated station. As results, whereas water temperature and total phosphorus were represented the positive correlation, N/P ratio was remarkably exhibited negative correlation. From the results, it is suggested that the PCS of midstream of GR was more affected by MH station than GC station, and the changes of temperature, phosphorus concentration, and N/P ratio may be important factors on the PCS formation of midstream of GR.

Pellicle is defined as a thin transparent film stretched over an aluminum (Al) frame that is glued on one side of a photomask. As semiconductor devices are pursuing higher levels of integration and higher resolution patterns, the cleaning of the Al flame surface is becoming a critical step because the contaminants on the Al flame can cause lithography exposure defects on the wafers. In order to remove these contaminants from the Al frame, a highly concentrated nitric acid (HNO3) solution is used. However, it is difficult to fully remove them, which results in an increase in the Al surface roughness. In this paper, the pellicle frame cleaning is investigated using various cleaning solutions. When the mixture of sulfuric acid (H2SO4), hydrofluoric acid (HF), hydrogen peroxide (H2O2), and deionized water with ultrasonic is used, a high cleaning efficiency is achieved without HNO3. Thus, this cleaning process is suitable for Al frame cleaning and it can also reduce the use of chemicals.