경남의 벼농사 대표 지대인 남부 중간지와 남부 평야지에서 질소 감비(7 kg/10 a)에 의한 고품질 쌀 생산을 위한 품종을 선발하고자 본 연구가 수행되었다. 7품종의 벼를 중간지에서 재배하였고 평야지에서는 10품종의 벼를 재배하여 평가하였다. 중간지에서 완전립의 수량은 보라미(526 kg/10 a)를 제외하고 대부분의 품종이 대조품종인 추청벼(533 kg/10 a)에 비해 높게 나타났다. 반면, 보라미와 고품벼, 온누리는 완전립률이 다른 품종에 비해 낮게 나타났다. 더욱이, 보라미와 대조품종인 추청벼는 도복지수가 다른 품종에 비해 높게 나타났다. 도정된 대조품종인 추청벼의 단백질 함량은 6.1%로 나타났고, 다른 품종들은 대조품종에 비해 비슷하거나 낮게 나타났다. 평야지에서는 남평벼(527 kg/10 a)만이 완전립 수량에서 대조품종인 일미벼(503 kg/10 a)에 비해 높게 나타났다. 그리고 호품벼, 신동진 그리고 칠보벼는 다른 품종들에 비해 완전립 비율이 더 낮게 나타났다. 그러나 호품벼(5.9%)와 진수미(6.0%), 신동진(5.9%), 칠보벼(6.0%), 황금노들(5.8%), 호평벼(6.0%)는 대조품종 일미벼(6.1%)에 비해 단백질 함량이 더 낮게 나타났다. 아밀로오스 함량, 백도, 식미 등은 두 지역에서 품종들 간 유의적 차이는 없었다. 결론적으로 완전립 비율, 완전립 수량, 단백질 함량, 도복 저항성, 등숙률 그리고 식미 등을 고려하면 중간지에서는 풍미1호, 새누리, 칠보벼가 평야지에서는 진수미, 황금노들이 고품질의 쌀을 생산하는데 적합한 품종으로 판단된다.

We investigated the insect community along altitudinal gradient to gather basic data for distributional monitoring of insect species in the forest ecosystem. The investigation area was Seon-gaksan (Mt.) in Jinan-gun, Jeollabuk-do province, where the bucket-light trap and pit-fall trap for quantification were installed in Quercus vegetation at altitude of 300m, 600m and 900m. The field collecting was performed on May, July and September 2013 respectively. ANOVA analysis was conducted to analyze the significance between insect species along altitude using the collected insect community data. Analysis of variance (ANOVA) results showed statistically significant differences among ground-beetles and ants abundance with altitude as a response variable. Although we expected a distinct cluster with the difference of altitude at each study site, nonmetric multidimensional scaling (NMS) showed distinct clusters with the moth, ground-beetles, and ant assemblage at altitudinal increase and sampling month. In the result, a total of 309 species in 18 families of nocturnal moths were collected by bucket-light trap. The insects collected in pit-fall trap were ground-beetles with 196 individuals of 26 species and ants with 11,276 individuals of 14 species respectively.

This study attempted to manufacture a Cu-Ga coating layer via the cold spray process and to investigate the applicability of the layer as a sputtering target material. In addition, changes made to the microstructure and prop- erties of the layer due to annealing heat treatment were evaluated, compared, and analyzed. The results showed that coating layers with a thickness of 520 mm could be manufactured via the cold spray process under optimal conditions. With the Cu-Ga coating layer, the α-Cu and Cu3Ga were found to exist inside the layer regardless of annealing heat treatment. The microstructure that was minute and inhomogeneous prior to thermal treatment changed to homogeneous and dense with a more clear division of phases. A sputtering test was actually conducted using the sputtering target Cu- Ga coating layer (~2 mm thickness) that was additionally manufactured via the cold-spray coating process. Consequently, this test result confirmed that the cold sprayed Cu-Ga coating layer may be applied as a sputtering target material.