Bacillus thuringiensis (Bt) is widely used as an environmentally friendly insecticide compared to chemical insecticides. However, challenges such as difficulty in direct practical application, limited efficacy duration, and stability have been identified. To solve these issues, formulation-based research is being extensively conducted. In this study, the high insecticidal activity strain Bt IMBL-B9, identified in previous research, was subjected to large-scale cultivation using a fermentor. Subsequently, various formulations were developed through formulation processes. and characteristics such as their wettability, suspensibility and particle size were assessed to select the optimized formulation.

Natural enemy insects, including predators and parasitoids, are beneficial organisms that feed upon other agricultural pests. Using natural enemy insects to suppress or prevent outbreak of pests is a key component of integrated pest management strategy. It is safe, effective, and environmentally friendly and can be applied easily to the greenhouses, filed crops and orchards. Rearing and application of natural enemy insects in biocontrol in China have a long history. As early as 1700 years ago, the predator Oecophylla smaragdina has been used for controlling many kinds of citrus pests. Up to now, more than 30 species of natural enemies that can be artificially mass produced and widely used for biological control of many kinds of pests, including caterpillars, aphids, whiteflies, thrips, leaf mites and scales in China. The annual average application area of natural enemies is over 11.34 million hectares. However, with the increasing demand of using natural enemies in biological control programs, the development of natural enemy insect industrialization still face many challenges. It is urgent to explore more effective candidate natural enemies, improve the production efficiency, increase the shelf life of products and enhance the colonization of natural enemy insects after release, and thus facilitate the commercially production and application of natural enemies. This is of great significance for comprehensively promoting the use of green prevention and control techniques for crop diseases and pests, reducing the use of chemical pesticides, ensuing the quality and safety of food and agricultural products, and ultimately promoting sustainable agricultural development.

Thin-film shape technology is recognized for its core technology to enhance the technology of LCD, PDP, semiconductor manufacturing processes, hard disks and optical disks, and is widely used to form coated thin films of products. In addition, resistance (electron beam filament) technology for heating is used to manufacture filament for ion implants used in semiconductor manufacturing processes. By establishing an electronic beam filament production system and developing seven specifications of electronic beam filament, it is contributing to improving trade dynamics and increasing exports to Japan through localized media of theoretical imports to domestic companies. In this study, CAE analysis was performed after setting electron beam filament specification and development objectives, facilities and fabrication for electron beam filament production, electron beam filament JIG & fixture design and fabrication followed by electron beam filament prototype. Then, the automation and complete inspection equipment of the previously developed electronic beam filament manufacturing facilities was developed and researched to mass-produce them, to analyze and modify prototypes, design and manufacture automation facilities, and finally, to design and manufacture the complete inspection equipment. In this paper, design and manufacture of electronic beam filament total inspection equipment for mass production were dealted with.

For practical applications of graphene sheets in a variety of fields, mass production of high-quality graphene sheets is necessary. Herein, we reported a cost-effective, green, and simple approach to synthesizing mass production exfoliated graphene (EG) flakes employing electrochemical exfoliation of pencil graphite in neutral aqueous electrolytes. Pencil graphite cores of different grades were applied as anode and cathode electrodes and exposed to the electrolyte solution at a different voltage. Several parameters were examined and optimized, including pencil grade (2,4,6,8 B), applied voltage (10, 15, 20, 30 V), different inorganic electrolytes ((NH4)2SO4, Na2SO4, NaNO3, NaCl, and CH3COONa), and the concentration of electrolytes. The optimal condition was chosen by considering the mass of produced graphene and the conductivity of the graphene solution. The optimal conditions were as follow: pencil grade: 6B; applied voltage: 10 V; electrolyte type: Na2SO4; electrolyte concentration: 0.1 M. Under these conditions, the production yield was > 95% within 3 h and 9 min. The EG was characterized by utilizing FT-IR, XRD, Raman spectroscopy, FE-SEM, Cyclic Voltammetry, and Electrochemical Impedance Spectroscopy (EIS). Characterization indicates that the synthesized EG had an XRD peak at 2θ = 26.6° and an ID/ IG ratio of 0.36. Furthermore, the EG showed good conductivity when tested by cyclic voltammetry and EIS whereas the R2 values were 985.8 and 76.3 Ω for bare GCE and EG/GCE, respectively. In addition, EG effectively removed cadmium (Cd(II)) with an adsorption level of 8.72 mg/g. The results from this study suggest that EG can be scaled up and commercialized in an environmentally friendly and low-cost manner, especially in low-income countries, and using it to rectify metal ions.

Thin-film shape technology is recognized for its core technology to enhance the technology of LCD, PDP, semiconductor manufacturing processes, hard disks and optical disks, and is widely used to form coated thin films of products. In addition, resistance (electron beam filament) technology for heating is used to manufacture filament for ion implants used in semiconductor manufacturing processes. By establishing an electronic beam filament production system and developing seven specifications of electronic beam filament, it is contributing to improving trade dynamics and increasing exports to Japan through localized media of theoretical imports to domestic companies. In this study, CAE analysis was performed after setting electron beam filament specification and development objectives, facilities and fabrication for electron beam filament production, electron beam filament JIG & fixture design and fabrication followed by electron beam filament prototype. Then, the automation and complete inspection equipment of the previously developed electronic beam filament manufacturing facilities was developed and researched to mass-produce them, to analyze and modify prototypes, design and manufacture automation facilities, and finally, to design and manufacture the complete inspection equipment. In this paper, analysis and modification of prototypes of electron beam filaments for mass production were dealted with.

Thin-film shape technology is recognized for its core technology to enhance the technology of LCD, PDP, semiconductor manufacturing processes, hard disks and optical disks, and is widely used to form coated thin films of products. In addition, resistance (electron beam filament) technology for heating is used to manufacture filament for ion implants used in semiconductor manufacturing processes. By establishing an electronic beam filament production system and developing seven specifications of electronic beam filament, it is contributing to improving trade dynamics and increasing exports to Japan through localized media of theoretical imports to domestic companies. In this study, CAE analysis was performed after setting electron beam filament specification and development objectives, facilities and fabrication for electron beam filament production, electron beam filament JIG & fixture design and fabrication followed by electron beam filament prototype. Then, the automation and complete inspection equipment of the previously developed electronic beam filament manufacturing facilities was developed and researched to mass-produce them, to analyze and modify prototypes, design and manufacture automation facilities, and finally, to design and manufacture the complete inspection equipment. In this paper, design and manufacture of electronic beam filament automation facilities for mass production were dealted with.

본 연구는 대체에너지, 생태복원 및 밀원식물용 등으로 이용되어 묘목 수요가 증가되고 있는 쉬나무의 우량한 용기묘 생산을 위한 적정 시비수준을 구명하고자 실시하였다. 공시용기는 임업시설양묘용 플라스틱 용기(350 ㎖/구)를 사용하였다. 시비처리는 무시비구와 함께 수용성 복합비료인 Multifeed 19 (N:P:K=19:19:19, v/v)를 500 ㎎·L-1, 1000 ㎎·L-1, 1500 ㎎·L-1, 2000 ㎎·L-1로 조절하여 시비하였다. 실험결과, 간장과 근원경 생장은 시비수준이 높아짐에 따라 높은 생장값을 나타내다가 1000 ㎎·L-1 이상의 시비에서는 낮아지는 경향을 보였다. 뿌리발달은 1000 ㎎·L-1에서 가장 왕성하였다. 건물생산량도 1000 ㎎·L-1에서 가장 높았고 전체적으로 간장 및 근원경 생장 결과와 유사한 경향으로 나타났다. 묘목의 품질을 나타내는 지수인 QI (Quality Index)도 1000 ㎎·L-1에서 0.97로 다른 처리구 보다 높게 조사 되었다. 연구결과를 종합하면, 쉬나무 용기묘의 우량한 묘목생산을 위한 적정 시비수준은 1000 ㎎·L-1로 판단되며, 쉬나무 용기묘의 대량생산을 위한 기초자료로 활용될 것으로 기대된다.

본 연구는 최근 산업곤충으로 주목받고 있는 쌍별귀뚜라미의 생산 효율 증대를 위해 수행되었다. 이를 위해 온도, 습도에 따른 부화율 및 부화 기간을 비롯하여 사육 밀도에 따른 생존율 및 산란 온도에 따른 산란수를 조사하였다. 적정 부화 상대습도는 90% 조건에서 부화율 90%를 보여 가장 높았다. 온도별 부화율 조사결과 20℃에서 98.3%로 가장 높았다. 또한, 온도별 부화 35℃조건에서 7.1일로 가장 짧게 나타났다. 또한 사육 용기에 3,000~20,000개체를 투입하여 35일간 조사한 밀도별 생존율은 34~18%였다. 쌍별귀뚜라미의 먹이에 채소 급여가 성장에 미치는 특성을 조사한 결과 생존율은 1.8배, 생체중량은 2.5배 높게 나타났다. 온도별 산란수 조사결과 25℃ 조건에서 30일 후 1,710개로 가장 높았다.

This study was conducted to investigate optimum conditions for mass production of ntagonistic microbes Alcaligenes sp. HC12. Alcaligenes sp. HC12 had a potent biological control agent to control browning disease caused by Pseudomonas agarici. Alcaligenes sp. HC12 markedly showed the antagonistic activity against Pseudomonas agarici, the most destructive pathogen of cultivated mushrooms. To define the optimum conditions for the mass production of the Alcaligenes sp. HC12, we have investigated optimum culture conditions and effects of various nutrient source on the bacterial growth. The optimum initial pH and temperature were determined as pH 9.0 and 30o, respectively. The optimal concentration of medium elements for the growth of pathogen inhibitor bacterium(Alcaligenes sp. HC12) was determined as follows: 0.5% dextrine, 1.5% yest extract, 1.0% NaNO3, 0.5% KH2PO4, and 1.5% asparagine.

나노섬유는 기존 합성 섬유와 비교하여 섬유의 직경을 획기적으로 줄여줌으로써 표면적을 비약적으로 향상시킬 수 있어 각종 필터 및 분리막, 전자 기기의 벤 트용 소재, 투습방수용 의류 등 산업 전 분야에 적용이 시도되고 있는 소재이다. 전기방사 기술은 섬유의 직경과 세공 등 물성과 성능을 쉽게 설계, 적용할 수 있어 고품질, 고성능의 멤브레인을 제공하고 있으나, 경제성을 갖춘 양산규모의 전기방사 기술이 어려워 긴 역사에 비해 기술적 성취도는 매우 낮은 상태이며, 부직포 타입으로 인해 응용분야의 한계가 있었다. 최근, 나노섬유를 장섬유 섬 유사로 개발하여 다양한 분야에 적용을 시도하려는 연구가 활발하게 진행되고 있다. 본 고에서는 다양한 나노섬유 양산화 기술 동향과 응용분야, 나노섬유 기반 장섬유 섬유사를 제조하는 최신 기술동향에 대해서 소개하고자 한다.