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폐놀계 화합물과 포름알데히드의 축합반응으로부터 노볼락 레진의 합성 KCI 등재
Synthesis of novolac resins by condensation of phenolic compounds with formaldehyde
이종대, 이태준, 이창훈, 조경태
- 언어KOR
- URLhttps://db.koreascholar.com/Article/Detail/257616
4,000원
한국응용과학기술학회지
(The Korean Society of Applied Science and Technology)
Vol.24 No.3 (2007.09)
pp.309-318
pp.309-318
한국응용과학기술학회(구 한국유화학회)
(The Korean Society of Applied Science and Technology (KSAST))
초록
Novolac is widely used as the primary solid component of most photoresists in semiconductor and microelectronic devices. In this study, novolac resins were prepared by condensation of 35% formaldehyde with phenolic compounds such as m-/p-cresol, 2,5-dimethylphenol and bisphenol A in the presence of oxalic acid as catalyst. The average molecular weight (Mw) of these novolac resins has been varied on the changing of mixing ratio of m-/p-cresol/2,5-dimethylphenol/bisphenol A or formaldehyde/phenolic compound. Also, thermal properties of novolac were observed by TGA.
키워드
novolacformaldehyde25-dimethylphenolbisphenol Aphotoresist
저자
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