Methanol as a carbon source in chemical vapor deposition (CVD) graphene has an advantage over methane and hydrogen in that we can avoid optimizing an etching reagent condition. Since methanol itself can easily decompose into hydrocarbon and water (an etching reagent) at high temperatures [1], the pressure and the temperature of methanol are the only parameters we have to handle. In this study, synthetic conditions for highly crystalline and large area graphene have been optimized by adjusting pressure and temperature; the effect of each parameter was analyzed systematically by Raman, scanning electron microscope, transmission electron microscope, atomic force microscope, four-point-probe measurement, and UV-Vis. Defect density of graphene, represented by D/G ratio in Raman, decreased with increasing temperature and decreasing pressure; it negatively affected electrical conductivity. From our process and various analyses, methanol CVD growth for graphene has been found to be a safe, cheap, easy, and simple method to produce high quality, large area, and continuous graphene films.

• Hyunjin Cho(Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Department of Organic Materials and Fiber Engineering, Chonbuk National University)
• Changhyup Lee(Soft Innovative Materials Research Center, Korea Institute of Science and Technology)
• In Seoup Oh(Soft Innovative Materials Research Center, Korea Institute of Science and Technology)
• Sungchan Park(Soft Innovative Materials Research Center, Korea Institute of Science and Technology, Department of Materials Science and Engineering, Chonbuk National University)
• Hwan Chul Kim(Department of Organic Materials and Fiber Engineering, Chonbuk National University) Corresponding Author
• Myung Jong Kim(Soft Innovative Materials Research Center, Korea Institute of Science and Technology) Corresponding Author