A simple method to deposit carbon nanotube films uniformly on large area substrates using an arc discharge method is reported in this paper. The arc discharge method was modified to deposit carbon nanotube films in situ on the substrates. The substrates were scanned several times over the arcing point for a uniform film thickness. Deposition was carried out under variable dc bias conditions at 600 torr of H2 gas. The thickness uniformity of the single-wall carbon nanotube films as characterized by a four-point probe was within 30% deviation. The morphology and crystal quality of the single-wall carbon nanotube film were also characterized by field emission scanning electron microscopy and Raman spectroscopy.

• 강영진 | Kang, Young-Jin
• 오동훈 | 오동훈
• 송혜진 | 송혜진
• 정진연 | 정진연
• 정혁 | 정혁
• 조유석 | 조유석
• 김도진 | 김도진