논문 상세보기
pp.30-37
The metal plating industry produces a large amount of wastewater generally containing heavy metals with various chemical compounds; as such, treating the wastewater is both an environmental and an economic challenge. A vacuum evaporation system has been developed to effectively reduce the volume of plating wastewater. However, the gas stream discharged from the distillation unit of the evaporator is often contaminated with high concentrations of odorous compounds such as ammonia and dimethyl disulfide (DMDS). In this study, a non-thermal plasma process operated in wet conditions was applied to remove the odorous compounds, and it showed high removal efficiencies of greater than 99% for ammonia and 95% for DMDS. However, the gas flowrate more substantially affected the efficiency of ammonia removal than the efficiency of DMDS removal, because the higher the gas flowrate, the shorter the contact time between the odorous compound and the mist particles in the wet plasma reactor. The analyses of the maximum removal capacity indicated that the wet non-thermal plasma system was effective for treating the odorous compounds at a loading rate of less than 20 mg/m3/min even though the lowest amount of electrical power was applied. Therefore, the wet-type non-thermal plasma system is expected alleviate to effectively abate the odor problem of the vacuum evaporator used in the treatment of plating wastewater.
2. 실험재료 및 방법
2.1 도금폐수
2.2 감압증발시스템
2.3 습식 저온플라즈마 시스템
2.4 분석방법
3. 결과 및 고찰
3.1 도금폐수 성상
3.2 도금폐수 감압증발과정에서 배출되는 악취 성상
3.3 습식저온플라즈마 적용 악취제거효율 평가
4. 결 론
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