Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm–2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm–1 and a very low surface roughness.

Abstract
 1. Introduction
 2. Experimental
  2.1. Materials
  2.2. Preparation of SU-8 micropatterns byPIBL
  2.3. Preparation of CMs by pyrolysis of SU-8micropatterns
  2.4. Characterization
 3. Results and Discussion
 4. Conclusions
 Conflict of Interest
 Acknowledgements
 References

• Hui-Gyun Nam(Department of Polymer Science and Engineering, Chungnam National University)
• Jin-Mook Jung(Department of Polymer Science and Engineering, Chungnam National University)
• In-Tae Hwang(Research Division for Industry and Environment, Korea Atomic Energy Research Institute)
• Junhwa Shin(Research Division for Industry and Environment, Korea Atomic Energy Research Institute)
• Chang-Hee Jung(Research Division for Industry and Environment, Korea Atomic Energy Research Institute) Corresponding Author
• Jae-Hak Choi(Department of Polymer Science and Engineering, Chungnam National University) Corresponding Author