Surface plasmon resonance is the resonant oscillation of conduction electrons at the interface between negative and positive permittivity material stimulated by incident light. In particular, when light transmits through the metallic microhole structures, it shows an increased intensity of light. Thus, it is used to increase the efficiency of devices such as LEDs, solar cells, and sensors. There are various methods to make micro-hole structures. In this experiment, micro holes are formed using a wet chemical etching method, which is inexpensive and can be mass processed. The shape of the holes depends on crystal facets, temperature, the concentration of the etchant solution, and etching time. We select a GaAs(100) single crystal wafer in this experiment and satisfactory results are obtained under the ratio of etchant solution with H2SO4:H2O2:H2O = 1:5:5. The morphology of micro holes according to the temperature and time is observed using field emission - scanning electron microscopy (FE-SEM). The etching mechanism at the corners and sidewalls is explained through the configuration of atoms.

Abstracts
 1. 서 론
 2. 실험 방법
 3. 결과 및 고찰
 4. 결 론
 References

• 이하영(한국해양대학교 전자소재공학과) | Ha Young Lee (Department of Electronic Materials Engineering, Korea Maritime and Ocean University)
• 곽민섭(한국해양대학교 전자소재공학과) | Min Sub Kwak (Department of Electronic Materials Engineering, Korea Maritime and Ocean University)
• 임경원(한국해양대학교 전자소재공학과) | Kyung-Won Lim (Department of Electronic Materials Engineering, Korea Maritime and Ocean University)
• 안형수(한국해양대학교 전자소재공학과) | Hyung Soo Ahn (Department of Electronic Materials Engineering, Korea Maritime and Ocean University)
• 이삼녕(한국해양대학교 전자소재공학과) | Sam Nyung Yi (Department of Electronic Materials Engineering, Korea Maritime and Ocean University) Corresponding author