Surface plasmon resonance is the resonant oscillation of conduction electrons at the interface between negative and positive permittivity material stimulated by incident light. In particular, when light transmits through the metallic microhole structures, it shows an increased intensity of light. Thus, it is used to increase the efficiency of devices such as LEDs, solar cells, and sensors. There are various methods to make micro-hole structures. In this experiment, micro holes are formed using a wet chemical etching method, which is inexpensive and can be mass processed. The shape of the holes depends on crystal facets, temperature, the concentration of the etchant solution, and etching time. We select a GaAs(100) single crystal wafer in this experiment and satisfactory results are obtained under the ratio of etchant solution with H2SO4:H2O2:H2O = 1:5:5. The morphology of micro holes according to the temperature and time is observed using field emission - scanning electron microscopy (FE-SEM). The etching mechanism at the corners and sidewalls is explained through the configuration of atoms.
The effluent discharge standards of industrial wastewater has become more stringent since 2003. Many industrial wastewater treatment plants has been upgraded to advanced treatment facilities. There are high concentrations of nitrate(>200 mg/L) and ammonium(>50 mg/L) nitrogen in the acrylic fiber wastewater of H textile Co. Wastewater from acrylic fiber industry containing acrylonitrile, which may affect the subsequent biological treatment process. Manufacturing of acrylic fiber also produces shock loadings. Excessive acrylonitrile and polymer debris produced in the polymerization process was screened, coagulated with CaO and settled down. A preaeration system was added to treat this high pH effluent to remove volatile organic compound and ammonia nitrogen by the air stripping effect. It was found that nitrification rate was not sufficient in the Anoxic/ Oxic(AO) process. One denitrification tank was converted to nitrification reactor to extend HRT of nitrification. Nitrification rate of ammonia nitrogen was promoted from 32% to 67% by this modification and effluent nitrogen concentration was well satisfied with the effluent standards since then.