ZnO/Cu/ZnO (ZCZ) thin films were deposited at room temperature on a glass substrate using direct current (DC) and radio frequency (RF, 13.56 MHz) magnetron sputtering and then the effect of post-deposition electron irradiation on the structural, optical, electrical and transparent heater properties of the films were considered. ZCZ films that were electron beam irradiated at 500 eV showed an increase in the grain sizes of their ZnO(102) and (201) planes to 15.17 nm and 11.51 nm, respectively, from grain sizes of 13.50 nm and 10.60 nm observed in the as deposited films. In addition, the film’s optical and electrical properties also depended on the electron irradiation energies. The highest opto-electrical performance was observed in films electron irradiated at 500 eV. In a heat radiation test, when a bias voltage of 18 V was applied to the film that had been electron irradiated at 500 eV, its steady state temperature was about 90.5 °C. In a repetition test, it reached the steady state temperature within 60 s at all bias voltages.

1. 서 론
2. 실험 방법
3. 실험 결과
4. 결 론
Acknowledgement

• 이연학(울산대학교 첨단소재공학부 학생) | Yeon-Hak Lee (School of Materials Science and Engineering, University of Ulsan, Ulsan 44776, Republic of Korea)
• 박민성(울산대학교 첨단소재공학부 학생) | Min-Sung Park (School of Materials Science and Engineering, University of Ulsan, Ulsan 44776, Republic of Korea)
• 김대일(울산대학교 첨단소재공학부 교수) | Daeil Kim (School of Materials Science and Engineering, University of Ulsan, Ulsan 44776, Republic of Korea) Corresponding author