Various thicknesses of Al-doped ZnO (AZO) films were deposited on glass substrate using pulsed dcmagnetron sputtering with a cylindrical target designed for large-area high-speed deposition. The structural,electrical, and optical properties of the films of various thicknesses were characterized. All deposited AZO filmshave (0002) preferred orientation with the c-axis perpendicular to the substrate. Crystal quality and surfacemorphology of the films changed according to the film thickness. The samples with higher surface roughnessexhibited lower Hall mobility. Analysis of the measured data of the optical band gap and the carrierconcentration revealed that there were no changes for all the film thicknesses. The optical transmittances weremore than 85% regardless of film thickness within the visible wavelength region. The lowest resistivity,4.13×10-4Ω·cm-1, was found in 750nm films with an electron mobility (µ) of 10.6cm2V-1s-1 and a carrierconcentration (n) of 1.42×1021cm-3.