In this study, two alignment methods were used to create a Fringe-Field Switching (FFS) mode liquid crystal device using an organic thin film (polyimide: PI) as an alignment layer. In addition, the electro-optical (EO) characteristics of the liquid crystal device manufactured in this way were investigated to evaluate the feasibility of mass production application of the technology. In general, the photo-alignment method using unpolarized ultraviolet rays can obtain a relatively low pretilt angle, so a liquid crystal device in FFS mode, which is a driving mode of the liquid crystal device that reflects the characteristics of liquid crystal alignment, was manufactured, and the liquid crystal has a high reactivity with the alignment film. Considering this, nematic liquid crystal (NLC) was used. In addition, in order to improve the misalignment, it was observed whether more stable orientation occurred by irradiating ultraviolet rays for an additional 1 to 3 hours in the aligned state. As a result of the experiment, it was found that NLC alignment occurs through a photodecomposition reaction caused by unpolarized UV irradiation oblique to the PI surface. In addition to the existing orientation method, UV irradiation was used to achieve a more stable orientation state and stable V-T curve and response characteristics. With liquid crystal alignment completed, more stable orientation characteristics and EO characteristics at the mass production level were obtained through additional UV irradiation for 3 hours. This method can further stabilize the orientation stability caused by existing UV irradiation through an additional process.

Abstract We demonstrate convenient alignment technologies using imprinting lithography with sol-gel process. The aligned nano pattern is fabricated on a silicon wafer by laser interference lithography. For conformal imprinting process, aligned nano pattern was transferred onto the polydimethylsiloxane (PDMS). Using a PDMS sheet with aligned nano pattern, aligned nano pattern was created onto the sol-gel driven hafnium zinc oxide by imprinting lithography. The process was conducted at annealing temperatures of 150 °C. The obtained pattern on the HfZnO film acted as a guide for aligning liquid crystal (LC) molecules. The geometric restriction induced by aligned pattern leads to LC alignment along to the aligned nano pattern. The combination of imprint lithography and solution-processed inorganic materials proved good alternative of LC alignment technique.