Surface plasmon resonance is the resonant oscillation of conduction electrons at the interface between negative and positive permittivity material stimulated by incident light. In particular, when light transmits through the metallic microhole structures, it shows an increased intensity of light. Thus, it is used to increase the efficiency of devices such as LEDs, solar cells, and sensors. There are various methods to make micro-hole structures. In this experiment, micro holes are formed using a wet chemical etching method, which is inexpensive and can be mass processed. The shape of the holes depends on crystal facets, temperature, the concentration of the etchant solution, and etching time. We select a GaAs(100) single crystal wafer in this experiment and satisfactory results are obtained under the ratio of etchant solution with H2SO4:H2O2:H2O = 1:5:5. The morphology of micro holes according to the temperature and time is observed using field emission - scanning electron microscopy (FE-SEM). The etching mechanism at the corners and sidewalls is explained through the configuration of atoms.

Automated real-time monitoring system for ground settlement based on hole effect sensor has been developed to overcome lots of limitations of existing hand-operated monitoring system. This new technology utilizes the hole effect sensors and automatically measures the real time surface and multi-depth ground settlement from signals composed of multi-depth magnetic field measuring system. This system including pore pressure measuring sensor does not require reference points in remote distance and all mointoring system could be installed in a single boring hole.