In this paper the results for thin multi-layer InGaAsP(1.3μm)/InP crystal growth by vertical liquid epitaxial growing furnance have been presented. The growth rates of InGaAsP layer and InP layer at cooling rate of 0.3℃/min and the growing temperature of 630℃ were obtained as 0.11 μm/min and 0.06 μm/min, respectively, by the uniform cooling with two phase solution technique.