Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm–2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm–1 and a very low surface roughness.

Crosslinked PVA membranes were fabricated by solution casting of the substituted PVA (SPVA), synthesized by the reaction of PVA with glycidyl acrylate (GMA) without catalyst in different molar ratios [-OH(PVA)/GMA], followed by electron beam irradiation. The chemical changes in the SPVA compared to PVA were confirmed from H-NMR and FT-IR analysis. Crosslinking degree and dimensional stability of the crosslinked PVA membranes also investigated by measuring gel fraction and dimensional change of the membranes under acidic and basic solution.

We report the preparation of sulfonated reduced graphene oxide (SRGO) by the sulfonation of graphene oxide followed by radiation-induced chemical reduction. Graphene oxide prepared by the well-known modified Hummer's method was sulfonated with the aryl diazonium salt of sulfanilic acid. Sulfonated graphene oxide (SGO) dispersed in ethanol was subsequently reduced by γ-ray irradiation at various absorbed doses to produce SRGO. The results of optical, chemical, and thermal analyses revealed that SRGO was successfully prepared by γ-ray irradiation-induced chemical reduction of the SGO suspension. Moreover, the electrical conductivity of SRGO was increased up to 2.94 S/cm with an increase of the absorbed dose.