색조 화장품 원료로 사용되는 무기안료 탈크와 소수성 실리카의 제타전위 차를 조절하여 표 면처리된 판상 무기안료 복합체를 제조하였다. 탈크는 색조 화장품의 처방에서 주로 쓰이는 판상 무기물 질로서 피부에 대한 발림성과 퍼짐성을 갖는 백색 안료이다. 또한 분산성과 신장성이 우수하며, 내열성, 내광성, 내화학성 등에 안정하다. 실리카는 일반적인 색조화장품에서 화장의 지속성을 높여주며 제형에 서의 안정성을 높여주는 역할을 한다. 본 연구에서는 탈크와 소수성 실리카를 각각 양이온성, 음이온성 계면활성제로 표면전하를 조절한 후 제타전위 차를 이용하여 탈크 표면에 소수성 실리카를 표면처리하 여 무기안료 복합체를 제조하였다. 제조된 무기안료 복합체는 소수성 실리카가 탈크 표면 위에 1㎛ 이 하로 코팅되어 있으며 효과적인 소수성을 띤다. 무기안료의 표면전하 분석을 위해 제타전위를 측정하였 고, 계면활성제 표면처리된 안료는 FT-IR 로 계면활성제의 작용기를 확인하였다. 무기안료 복합체의 표 면은 SEM, EDS, FIB 등으로 관찰하였으며, XRD, FT-IR 등으로 구조를 확인하였다.

Al2O3 nanosol dispersed under ethanol or N-Methyl-2-pyrrolidone(NMP) was studied and optimized with various dispersion factors and by utilizing the silane modification method. The two kinds of Al2O3 powders used were prepared by thermal decomposition method from aluminum ammonium sulfate(AlNH4(SO4)2) while controlling the calcination temperature. Al2O3 sol was prepared under ethanol solvent by using a batch-type bead mill. The dispersion properties of the Al2O3 sol have a close relationship to the dispersion factors such as the pH, the amount of acid additive(nitric acid, acetic acid), the milling time, and the size and combination of zirconia beads. Especially, Al2O3 sol added 4 wt% acetic acid was found to maintain the dispersion stability while its solid concentration increased to 15 wt%, this stability maintenance was the result of the electrostatic and steric repulsion of acetic acid molecules adsorbed on the surface of the Al2O3 particles. In order to observe the dispersion property of Al2O3 sol under NMP solvent, Al2O3 sol dispersed under ethanol solvent was modified and solventexchanged with N-Phenyl-(3-aminopropyl)trimethoxy silane(APTMS) through a binary solvent system. Characterization of the Al2O3 powder and the nanosol was observed by XRD, SEM, ICP, FT-IR, TGA, Particles size analysis, etc.

To study the dispersion factors of silica sol prepared from fumed silica powder, we prepared silica sol under an aqueous system using a batch type bead mill. The dispersion properties of silica sol have a close relationship to dispersion factors such as pH, milling time and speed, the size and amount of zirconia beads, the solid content of fumed silica, and the shape and diameter of the milling impellers. Especially, the silica particles in silica sol were found to show dispersion stability on a pH value above 7, due to the electrostatic repulsion between the particles having a high zeta potential value. The shape and diameter of the impellers installed in the bead mill for the dispersion of fumed silica was very important in reducing the particle size of the aggregated silica. The median particle size (D50) of silica sol obtained after milling was also optimized according to the variation of the size and amount of the zirconia beads that were used as the grinding medium, and according to the solid content of fumed silica. The dispersion properties of silica sol were investigated using zeta potential, turbiscan, particle size analyzer, and transmission electron microscopy.

CMP(Chemical Mechanical Polishing) Processes have been used to improve the planarization of the wafers in the semiconductor manufacturing industry. Polishing performance of CMP Process is determined by the chemical reaction of the liquid sol containing abrasive, pressure of the head portion and rotational speed of the polishing pad. However, frictional heat generated during the CMP process causes agglomeration of the particles and the liquidity degradation, resulting in a non-uniform of surface roughness and surface scratch. To overcome this chronic problem, herein, we introduced NaCl salt as an additive into silica sol for elimination the generation of frictional heat. The added NaCl reduced the zata potential of silica sol and increased the contact surface of silica particles onto the sapphire wafer, resulting in increase of the removal rate up to 17 %. Additionally, it seems that the silica particles adsorbed on the polishing pad decreased the contact area between the sapphire water and polishing pad, which suppressed the generation of frictional heat.

MicroRNAs (miRNAs, miRs) are about 21-25 nucleotides in length and regulate mRNA translation by base pairing to partially complementary sites, predominantly in the 3’-untranslated region (3’-UTR) of the target mRNA. In this study, the expression profile of miRNAs was compared and analyzed for the establishment of miRNA-related odontoblast differentiation using MDPC-23 cells derived from mouse dental papilla cells. To determine the expression profile of miRNAs during the differentiation of MDPC-23 cells, we employed miRNA microarray analysis, quantitative real-time PCR (qRT-PCR) and Alizaline red-S staining. In the miRNA microarray analysis, 11 miRNAs were found to be up- or down-regulated more than 3-fold between day 0 (control) and day 5 of MDPC-23 cell differentiation among the 1,769 miRNAs examined. In qRT-PCR analysis, the expression levels of two of these molecules, miR-194 and miR-126, were increased and decreased in the control MDPC-23 cells compared with the MDPC-23 cells at day 5 of differentiation, respectively. Importantly, the overexpression of miR-194 significantly accelerated mineralization compared with the control cultures during the differentiation of MDPC-23 cells. These results suggest that the miR-194 augments MDPC-23 cell differentiation, and potently accelerates the mineralization process. Moreover, these in vitro results show that different miRNAs are deregulated during the differentiation of MDPC-23 cells, suggesting the involvement of these genes in the differentiation and mineralization of odontoblasts.