In this study, TbDyFe thin films with the thickness of 1000 Å are fabricated by DC magnetron sputtering. TbDyFe thin films are prepared by DC magnetron sputtering method. The pressure of Ar gas below 1.33 kPa and DC input power of 200 W are used for the sputtering conditions. During sputtering process the substrate holder is heated up to 150 ℃. The thin films are deposited to a thickness of 1000 Å on polyimide substrate with a thickness of 2 μm. The fabricated microstructures are observed by X-ray diffraction (XRD) and the film thickness is measured. Magnetostrictions are determined from the curvature of the thin films which are measured by the optical cantilever method. The experimental results are discussed with numerical data.

Magnetostrictive actuator is fabricated with epoxy bonding method instead of sputtering method in this study. Fabrication process and experimental measurement method for magneto-mechanical characteristics is proposed. For the design of highly flexible magnetostrictive actuator, TbDyFe epoxy bonding with SU-8 substrate is adopted. The fabrication process for SU-8 substrate and the epoxy bonding is suggested and magnetostrictive behavior is investigated. Variable magnetic field is applied to measure the various magnetostrictive characteristics and magnetostriction is measured with different waves and different magnitude of magnetic field.

비정질 Tb45.7 Fe54.3-x /Cox 및 Tb50.2 /Fe 49.8-x/Cox (0≤x≤9.6) 합금박막의 자기적 특성 및 자기변형특성에 대하여 체계적으로 조사하였다. 박막제조는 Fe 타게트에 Tb, Co 소편으로 구성된 복합타겟 방식의 rf 마그네트론 스퍼터링법에 의해 제조하였다. XRD 조사에의 한 박막의 미세구조는 잘 발달된 비정질 구조를 나타내었다. Tb45.7 Fe54.3-x Cox (x=2~4)에서 우수한 고유자기변형특성 및 저자기장자기변형특성을 얻었다. 즉, 100 Oe의 저자장에서 130ppm의 자기변형을 나타내었으며 고유자기변형 (인가 자기장, 5 kOe)은 330ppm에서 400ppm으로 증가하였다.