ITO 투명 전극 필름은 디스플레이, 전기 자동차 등 산업 전 범위에서 널리 사용되는 전자 재료이다. 본 연구에서는 이러한 indium tin oxide (ITO) 필름의 열성형 안정성을 향상시키기 위하여 Poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) 전도성 고분자 코팅 용액 조성을 결정하였다. 1000 S/cm의 고 전도성을 보이는 PEDOT:PSS 용액에 끓는점이 각기 다른 4가지 종류의 용매를 희석하였고, 코팅 전 후 면저항 변화를 분석하였다. 또한 380~800 nm 영역의 광 투과율 분 석 및 Raman 스펙트럼 분석을 통하여 PEDOT:PSS 박막이 코팅된 ITO 투명 전극의 전기적 특성 결정 메커니즘을 규명하였 다. 230°C 열성형 공정 결과 ITO 필름은 113% 연신 상태에서 이미 전기 전도성을 읽었지만, ethylene glycol을 희석 용매로 사용하여 얻어진 전도성 고분자 박막이 적용된 ITO 필름은 126% 고 연신 상태에서도 초기 60 Ω/sq 면저항을 246 Ω/sq로 유지하는 우수한 전기 전도성을 보였다.

연구에서는 새로 설계한 고분자 절연체 위에 전자 주개(Donor)-받개(Acceptor) 기반의 반도체성 공중합체인 Cyclopentadithiophene-alt-benzothiadiazole (CDT-BTZ)를 활성 반도체층으로 형성하여 제작한 고분자 반도체 전계효과 트랜지스터의 전기적 특성을 살펴보았다. 이 연구에서 제시하는 고분자 절연체 박막은 내열성과 전기절연성이 우수한 포스파젠과 멜리민 구조가 가교된 형태를 가지기 때문에 0.006 nm의 매우 평탄한 RMS 표면 거칠기를 가졌으며, 4.5 MV/cm 이상의 매우 우수한 절연강도와 1.55의 다소 낮은 유전 상수를 가진 것으로 측정되었다. 그리고, 고분자 절연 막과 계면을 이루는 CDT-BTZ D-A 타입 반도체성 공중합체 박막은 2.0 x 10-3 cm2/Vs의 선형영역 이동도와 1.0 x 10-3 cm2/Vs의 포화영역 이동도를 갖는 것으로 측정되었다. 이를 통해, 고분자 절연체 위에 형성된 CDT-BTZ 고분자 반도체 박막은 유연 전자회로의 스위칭 소자로 쓰이기에 충분한 잠재성이 있다고 여겨진다.

Growing demands for reducing energy consumption have raised interest to design advanced materials for thin film composite (TFC) desalination membranes with high permselectivity and low fouling. Here, we synthesized a star-shaped polymer as a new building block material, which can be assembled into selective layer of the TFC membrane via a facile interfacial polymerization (IP). Star polymer with compact globular structure and high density amine functional groups enabled to fabricate higher permselectivity and lower fouling propensity membrane compared to commercial membranes. In addition, star polymer assembled TFC membrane can function as either nanofiltration or reverse osmosis membrane by simply adjusting IP process conditions, which cannot feasible in conventional materials, demonstrating remarkable versatility of our star polymer.

Glancing angle deposition (GLAD) is a powerful technique to control the morphology and microstructure of thin film prepared by physical vapor deposition. Chromium (Cr) thin films were deposited on a polymer substrate by a sputtering technique using GLAD. The change in thickness and Vickers microhardness for the samples was observed with a change in the glancing angle. The adhesion properties of the critical load (Lc) by a scratch tester for the samples were also measured with varying the glancing angle. The critical load, thickness and Vickers microhardness for the samples decreased with an increase in the glancing angle. However, the thickness of the Cr thin film prepared at a 90o glancing angle showed a relatively large value of 50 % compared to that of the sample prepared at 0o. The results of X-ray diffraction and scanning electron microscopy demonstrated that the effect of GLAD on the microstructure of samples prepared by sputter technique was not as remarkable as the samples prepared by evaporation technique. The relatively small change in thickness and microstructure of the Cr thin film is due to the superior step-coverage properties of the sputter technique.

Oxide semiconductors Thin-film transistors are an exemplified one owing to its excellent ambient stability and optical transparency. In particular zinc oxide (ZnO) has been reported because It has stability in air, a high electron mobility, transparency and low light sensitivity, compared to any other materials. For this reasons, ZnO TFTs have been studied actively. Furthermore, we expected that would be satisfy the demands of flexible display in new generation. In order to do that, ZnO TFTs must be fabricated that flexible substrate can sustain operating temperature. So, In this paper we have studied low-temperature process of zinc oxide(ZnO) thin-film transistors (TFTs) based on silicon nitride (SiNx)/cross-linked poly-vinylphenol (C-PVP) as gate dielectric. TFTs based on oxide fabricated by Low-temperature process were similar to electrical characteristics in comparison to conventional TFTs. These results were in comparison to device with SiNx/low-temperature C-PVP or SiNx/conventional C-PVP. The ZnO TFTs fabricated by low-temperature process exhibited a field-effect mobility of 0.205 cm2/Vs, a thresholdvoltage of 13.56 V and an on/off ratio of 5.73×106. As a result, We applied experimental for flexible PET substrate and showed that can be used to ZnO TFTs for flexible application.

Transparent ITO films were deposited on a polycarbonate substrate with RF magnetron sputtering in a pure argon(Ar) and oxygen (O2) gas atmosphere, and then post deposition electro annealed for 20 minutes in a 4×10-1Pa vacuum. Electronbombardment with an accelerating voltage of 100V increased the substrate temperature to 120oC. XRD analysis of the depositedITO films did not show any diffraction peaks, while electro annealed films indicated the growth of crystallites on the (211), (222),and (400) planes. The sheet resistance of ITO films decreased from 103 to 82Ω/□. The optical transmittance of ITO films inthe visible wavelength region increased from 85 to 87%. Observation of the work function demonstrated that the electro-annealingincreased the work function of ITO films from 4.4 to 4.6eV. The electro annealed films demonstrated a larger figure of meritof 3.0×10-3Ω-1 than that of as deposited films. Therefore, the electro annealed films had better optoelectrical performances thanas deposited ITO films.