In order to produce size-controllable Ag nanoparticles and a nanomesh-patterned Si substrate, we introduce a rapid thermal annealing(RTA) method and a metal assisted chemical etching(MCE) process. Ag nanoparticles were self-organized from a thin Ag film on a Si substrate through the RTA process. The mean diameter of the nanoparticles was modulated by changing the thickness of the Ag film. Furthermore, we controlled the surface energy of the Si substrate by changing the Ar or H2 ambient gas during the RTA process, and the modified surface energy was evaluated through water contact angle test. A smaller mean diameter of Ag nanoparticles was obtained under H2 gas at RTA, compared to that under Ar, from the same thickness of Ag thin film. This result was observed by SEM and summarized by statistical analysis. The mechanism of this result was determined by the surface energy change caused by the chemical reaction between the Si substrate and H2. The change of the surface energy affected on uniformity in the MCE process using Ag nanoparticles as catalyst. The nanoparticles formed under ambient Ar, having high surface energy, randomly moved in the lateral direction on the substrate even though the etching solution consisting of 10 % HF and 0.12 % H2O2 was cooled down to -20˚C to minimize thermal energy, which could act as the driving force of movement. On the other hand, the nanoparticles thermally treated under ambient H2 had low surface energy as the surface of the Si substrate reacted with H2. That's why the Ag nanoparticles could keep their pattern and vertically etch the Si substrate during MCE.

Multi-source evaporation is one of the methods to improve the thickness uniformity of thin films deposited by evaporation. In this study, a simulator for the relative thickness profile of a thin film deposited by a multi-source evaporation system was developed. Using this simulator, the relative thickness profiles of the evaporated thin films were simulated under various conditions, such as the number and arrangements of sources and source-to-substrate distance. The optimum conditions, in which the thickness uniformity is minimized, and the corresponding efficiency, were obtained. The substrate was a 5th generation substrate (dimensions of 1300 mm × 1100 mm). The number of sources and source-to-substrate distance were varied from 1 to 6 and 0 to the length of the major axis of the substrate (1300 mm), respectively. When the source plane, the area on which sources can be located, is limited to the substrate dimension, the minimum thickness uniformity, obtained when the number of sources is 6, was 3.3%; the corresponding efficiency was 16.6%. When the dimension of the source plane is enlarged two times, the thickness uniformity is remarkably improved while the efficiency is decreased. The minimum thickness uniformity, obtained when the number of sources is 6, was 0.5%; the corresponding efficiency was decreased to 9.1%. The expansion of the source plane brings about not only the improvement of the thickness uniformity, but also a decrement of the efficiency and an enlargement of equipment.

본 연구는 공정육묘시 삽목용토, 셀크기 및 시비체 계가 국화묘의 생장과 정식 후 생육에 미치는 영향을 구명하고자 실시하였다. 하추국 정운을 공시하여, 상토 는 TKS1, 훈탄, 훈탄+코코피트, 산흙(관행)과 플러그 트레이 크기를 72구, 128구, 200구로 하여 유묘의 생 육을 조사하였다. 양액농도 처리는 EC 0.9, EC 1.8, EC 2.6dS·m-1, 관행(요소 0.3%)로 하여 삽목 후 10 일부터 1, 3, 5회로 엽면살포 하였다. 상토의 종류에 있어서 묘소질은 훈탄+코코피트(1:1, v/v) 상토에서 가 장 양호하게 나타났으며, 이 후의 생육에 있어서도 가 장 좋은 결과를 나타내었다. 그러나 시판용 상토인 TKS1에서는 초기 생육은 다소 도장되는 경향이었다. 어린 묘와 수확 전 식물체의 생육은 72구 플러그 트레이에서 가장 양호하였으며, 그 이하의 크기(128과 200구) 트레이에서는 초장 및 생체중이 감소하는 경향 이었으나, 정상묘의 생산에는 문제없었다. 삽목에 의한 국화 플러그묘 생산에 있어 양액농도와 처리횟수가 많 을수록 초장 등 생장이 늘어났으나, 0.9dS·m-1는 생장 이 너무 더디었고, 2.6dS·m-1는 과번무 등 농도장해를 보여, EC 1.8dS·m-1와 5회 처리가 가장 양호한 것으 로 나타났다.

The effects of substrate size on the growth of microphytobenthos Achnanthes sp., Amphora sp., Navicula sp. and Nitzschia sp. were examined using glass beads in order for phytoremediation in the benthic layer of coastal waters. The glass beads used in this study were 0.09～0.15 mm (G.B 1), 0.25～0.50 mm (G.B 2), 0.75～1.00 mm (G.B 3) and 1.25～1.65 mm (G.B 4). No addition of glass bead used as control. The specific growth rate and maximum cell density of four microphytobenthos species were increasing with decreasing size of glass beads. Moreover, the control experiment without added attachment substrates showed the lowest specific growth rate and maximum cell density. Therefore, the suitable attachment substrates for mass culture of microphytobenthos seems to be important in order for phytoremediation using microphytobenthos.