Single crystal ZnIn2S4 layers were grown on thoroughly etched semi-insulating GaAs(100) substrateat 450oC with hot wall epitaxy (HWE) system by evaporating ZnIn2S4 source at 610oC. The crystalline structureof the single crystal thin films was investigated by the photoluminescence (PL) and double crystal X-ray rockingcurve (DCRC). The temperature dependence of the energy band gap of the ZnIn2S4 obtained from theabsorption spectra was well described by the Varshni’s relation, Eg(T)=2.9514eV-(7.24×10−4eV/K)T2/(T＋489K). After the as-grown ZnIn2S4 single crystal thin films were annealed in Zn-, S-, and In-atmospheres, theorigin of point defects of ZnIn2S4 single crystal thin films has been investigated by the photoluminescence (PL)at 10K. The native defects of VZn, VS, Znint, and Sint obtained by PL measurements were classified as a donorsor acceptors type. And we concluded that the heat-treatment in the S-atmosphere converted ZnIn2S4 singlecrystal thin films to an optical p-type. Also, we confirmed that In in ZnIn2S4/GaAs did not form the nativedefects because In in ZnIn2S4 single crystal thin films existed in the form of stable bonds.

순수한 Rutile에서 점결함의 형태와 전기적 특성을 연구하기 위해 1~10-23atm의 산소분압 범위 및 700~1300˚C의 온도 범위에서 전기전도도를 측정하였다. 전기전도도의 산소분압 의존성(logσ/logPo2)으로부터 산소분압 및 온도 변화에 따라 다음과 같은 지배적인 결함들을 제안한다. 1) TinO2n-1, 2)침입형 Ti 이온 3)2가로 하전된 산소빈자리 4)불순물에 의해 형성된 2가로 하전된 산소빈자리 5) n-p전이 및 p형 전도 또한, 고유범위의 실험결과로부터 계산한 Ti와 Vo의 결함형성 엔탈피는 각각, 10.2eV와 4.92eV였다.