A new process for polymeric gate insulator in field-effect transistors was proposed. Fourier transform infrared absorption spectra were measured in order to identify ODPA-ODA polyimide. Its breakdown field and electrical conductivity were measured. All-organic thin-film transistors with a stacked-inverted top-contact structure were fabricated to demonstrate that thermally evaporated polyimide films could be used as a gate insulator. As a result, the transistor performances with evaporated polyimide was similar with spin-coated polyimide. It seems that the mass-productive in-situ solution-free processes for all-organic thin-film transistors are possible by using the proposed method without vacuum breaking.

Using CdCl2 buffer solution as subphase for LB films deposition, it was achieved successively to fabricate the Y-type mixed LB films of (N-eicosyl pyridinium)-TCNQ(1:2) complex and arachidic acid. By measure of U.V spectra and capacitance, deposition status was confirmed. Electrical conductivity was measured on a perpendicular direction of the LB films and in consequence of calculated was average 2.5 × 10-13 - 2 × 10-14 S/cm.