Cu(In,Ga)Se2(CIGS) photovoltaic thin films were electrodeposited on Mo/glass substrates with an aqueous solution containing 2 mM CuCl2, 8 mM InCl3, 20 mM GaCl3 and 8mM H2SeO3 at the electrodeposition potential of -0.6 to -1.0 V(SCE) and pH of 1.8. The best chemical composition of Cu1.05In0.8Ga0.13Se2 was found to be achieved at -0.7 V(SCE). The precursor Cu-In-Ga-Se films were annealed for crystallization to chalcopyrite structure at temperatures of 100-500˚C under Ar gas atmosphere. The chemical compositions, microstructures, surface morphologies, and crystallographic structures of the annealed films were analyzed by EPMA, FE-SEM, AFM, and XRD, respectively. The precursor Cu-In-Ga-Se grains were grown sparsely on the Mo-back contact and also had very rough surfaces. However, after annealing treatment beginning at 200˚C, the empty spaces between grains were removed and the grains showed well developed columnar shapes with smooth surfaces. The precursor Cu-In-Ga-Se films were also annealed at the temperature of 500˚C for 60 min under Se gas atmosphere to suppress the Se volatilization. The Se amount on the CIGS film after selenization annealing increased above the Se amount of the electrodeposited state and the MoSe2 phase occurred, resulting from the diffusion of Se through the CIGS film and interaction with Mo back electrode. However, the selenization-annealed films showed higher crystallinity values than did the films annealed under Ar atmosphere with a chemical composition closer to that of the electrodeposited state.

Mo thin films were used for the back electrode because of the low resistivity in the Mo/CuInGaSe2 contact inchalcopyrite solar cells. 1µm thick Mo thin films were deposited on soda lime glass by varying the Ar pressure with the dc-magnetron sputtering process. The effects of the Ar pressure on the morphology of the Mo back electrode were studied andthe relationships between the morphology and electro-optical properties, namely, the resistivity as well as the reflectance of theMo thin films, were investigated. The resitivity increased from 24µΩ·cm to 11833µΩ·cm; this was caused by the increasedsurface defect and low crystallinity as the Ar pressure increased from 3×10−3 to 3×10−2Torr. The surface morphologies ofthe Mo thin films changed from somewhat coarse fibrous structures to irregular and fine celled strucutures with increased surfacecracks along the cell boundaries, as the Ar pressure increased from 3×10−3 to 3×10−2Torr. The changes of reflectances in thevisible light range with Ar pressures were mainly attributed to the surface morphological changes of the Mo thin films. Thereflectance in the visible light range showed the highest value of 45% at 3×10−3Torr and decreased to 18.5% at 3×10−2Torr.