Detection and sizing of defects are very important for structure life management base on fracture mechanics. The non-destructive inspection techniques based on the induced current field measurement are newly developed. This paper describes the results obtained by these techniques for artificial surface defects. In the case of the RICFM technique, the potential drop distribution around a surface defects was measured as a smaller potential drop than that in a place without a defect. This potential drop showed a minimum value at the defect location, and the absolute value of this minimum value increases depending on the depth of the defect. In the case of the FEF technique, the potential difference distribution for surface defects was measured as a maximum at the location of the defect. This maximum value showed a difference depending on the depth of the defect.

Defects in most structures can be generated not only on outside but also on inside or on the back-side during the manufacturing or construction process. Also they cause the growth of defects due to operation of various complex environments and structures will be destroyed eventually. In order to improve the reliability of the structure, the detection and size-estimation of defects should be investigated. In this paper, as an extension of previous studies on surface defects, two-dimensional artificial backside cracks (blind cracks) into paramagnetic material were evaluated by using the same aluminum probe. The potential drop at the defect position is distributed in the n-shape in the case of the back defect, which is different from results of the surface defect (u-shape). The potential drops at the defect position are measured with the largest value. The potential drop ratio (Vcmax/Vs) for the defective position is used as a parameter to predict the thickness (l) of defect position.

Most structures require high reliability to ensure safety and soundness. The materials used for these structures are not only defective in the manufacturing process and construction process, but also cause generation and progress of defects due to operation of various complex use environments. In order to improve the reliability of the structure, it is very important to detect and estimate the defect size. The method of evaluating these defects without damaging the structure is a non-destructive method. In this paper, an aluminum probe of AC potential drop(ACPD) method is applied to the evaluation of two-dimensional artificial defects in ferromagnetic materials. Since the potential drop of the defect end is larger than that of the sound area, the defect can be detected and its position can be clearly confirmed, and the potential drops are changed according to the depth of the defect. The potential drop ratio (Vjmax/Vs) of the defective area has a large value for the defect. The relationship between the potential drop ratio (Vjmax/Vs) of 10 kHz and the defect depth can reduce the error in predicting the depth.

계면동전위(electrokinetic potential)로 불리는 제타전위(zeta potential)란 표면 전하적 특성을 정량화한 값으로, 전기동역학적 현상으로 인하여 발생하는 전기적 유동층을 통과하는 전위차를 말한다. 이러한 제타전위는 표면화학분야의 기초, 응용적인 연구에서 중요하다. 제타전위는 용액 내에서 표면 전하 특성 정보를 얻을 수 있다. 이를 측정하는 방법으로는 계면동전위효과(electrokinetic effects)를 이용한다. 현재 위 효과를 이용하여 제타전위 측정 기기로 측정이 쉽게 가능하고, 많은 연구가 진행되어왔다. 본 연구에서는 계면동전위의 원리, 측 정, 결과 등을 제시하면서 분리막 표면 특성평가에 관한 내용을 제시하였다.

탄소전극과 이온교환막을 결합한 막결합 축전식 탈염(MCDI) 셀을 이용하여 환원전위가 다른 Na+과 Cu2+ 이온 혼합용액에서 Cu2+ 이온의 제거 특성을 연구 하였다. MCDI 셀에 일정한 전류밀도(1.5 mA/cm2)를 공급하면서 탈염을 실시한 결과 Cu2+ 이온은 일정한 제거속도를 유지하였지만 Na+ 이온의 제거량은 시간에 따라 감소하였다. 이는 Cu2+ 이온은 전착반응에 의해, Na+ 이온은 전기흡착 반응에 의해 제거되기 때문인 것으로 판단된다. Cu2+ 이온의 당량비가 0.14, 0.38, 0.50인 혼합용액을 탈염한 결과 제거된 이온 중 Cu2+ 이온의 당량비는 각 각 0.27, 0.60, 0.79로 나타났다. 이를 통해 Cu2+ 이온의 전착반응에 의해 혼합용 액에서 Cu2+ 이온의 제거율을 증가시킬 수 있음을 알 수 있었다.

Hydrobromic acid salts of new N, N, O tridentate ligands containing phenol, 2-[(2-Methylamino- ethylamino)-methyl]-phenol(H-MMP․2HBr), 5-Bromo-2-[(2-Methylamino-ethylamino)-methyl]-phenol (Br- MMP․2HBr), 5-Chloro-2-[(2-Methylamino-ethylamino)-methyl]-phenol(Cl-MMP․2HBr), 5-Methyl-2-[(2-Methylamino- ethylamino)-methyl]-phenol(Me-MMP․2HBr), 5-Methoxy-2-[(2-Methylamino-ethylamino)- methyl]-phenol(MeO- MMP․2HBr) and 1-[(2-Methylamino-ethylamino)- methyl]-naphthalen-2-ol(Nap- MMP․2HBr) were synthesized. The synthesized ligands were confirmed by C. H. N. atomic analysis, UV-visible and IR spectroscopies, 1H NMR, 13C NMR and mass analysis. The potentiometry study revealed that the proton dissociation constants(logKnH) of the synthesized ligands and stability constants (logKML, logKML2) of transition metal complexes of Co(II), Ni(II), Cu(II), Zn(II), Cd(II) and Pb(II) ions occurred in three steps and the order of the calculated overall proton dissociation constants(logβp) and stability constants (logKML) of ligands was Br-MMP․2HBr < Cl-MMP․2HBr < H-MMP․2HBr < Nap-MMP․2HBr < Me-MMP․2HBr < MeO-MMP․2HBr. The order showed a similar trend to that of Hammett substituent constants(δp). The synthesized ligands usually form 2:1(ML2) complexes with transition metal ions. The order of the stability constants of each transition metal ions was Co(II) < Ni(II) < Cu(II) > Zn(II) > Cd(II) > Pb(II).