Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glasssubstrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a hightransmittance of above 80% in the visible range and a low electrical resistivity of 4.5×10-4Ω·cm. The surfacemorphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature,working pressure, and etching time in the etching process. The optimized surface morphology with a cratershape is obtained at a heater temperature of 350oC, working pressure of 0.5 mtorr, and etching time of 45seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) aresignificantly affected by the resulting surface morphologies of textured films. The film surfaces, havinguniformly size-distributed craters, represent good light scattering properties of high haze and ADF values.Compared with commercial Asahi U (SnO2:F) substrates, the suitability of textured ZnO:Al films as frontelectrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical andoptical properties.

Nanostructured Cu-AlO composite powders were synthesized by thermochemical process. The synthesis procedures are 1) preparation of precursor powder by spray drying of solution made from water-soluble copper and aluminum nitrates, 2) air heat treatments to evaporate volatile components in the precursor powder and synthesis of nano-structured CuO + O, and 3) CuO reduction by hydrogen into pure Cu. The suggested procedures stimulated the formation of the gamma-AlO, and different alumina formation behaviors appeared with various heat treating temperatures. The mean particle size of the final Cu/AlO composite powders produced was 20 nm, and the electrical conductivity and hardness in the hot-extruded bulk were competitive with Cu/AlO composite by the conventional internal oxidation process

PDP용 투명유전체 재료로 사용되는 PbO-B2O3-SiO2-Al2O3계의 소성과정 중에서 투명전극 (ITO)과의 반응성 및 광학적, 열적, 전기적 특성을 조사하였다. 본 연구에서 유전체막.두께는 12μm으로, 온도는 550-580˚C에서 소성한 후 여러 물성을 평가하였다 그 결과로, 유전체와 투명전극(ITO)의 반용에서, In 이온이 유전체층으로 확산이동하였으며, Sn 확산은 거의 발생하지 않았다. 선팽창계수, 유전상수, 유리전이온도,광 투과율은 유전체 조성의 PbO 양에 큰 영향을 받았다. PbO양 증가는 선팽창계수와 유전상수를 증가시킨 반면, 유리전이온도와 광 투과율온 저하시켰다. Al2O3/B2O3 비가 증가함에 따라서는 선팽창계수는 감소, 유전상수는 증가, 광 투과율은 감소하였으며, 유리 전이점 변화는 거의 나타나지 않았다.

플라즈마 회전전극법으로 제조된 Ti-51at%Al 금속간화합물 분말에 함유된 불순물의 함량변화를 분석하였다. 산소와 탄소의 함량은 각각 600 및 200ppm 정도로 분말입도에 따라 변하였으며, 이는 주로 원재료에 포함된 불순물의 영향이었다. AES 분석에 의하면 분말표면 산화물은 주로 Ti 및 Al과 산소 및 탄소의 복합화합물로 구성되었으며, 그 두께는 약 100 및 200μm 크기의 분말에 대하여 각각 7 및 3.4nm 정도로 측정되었다. 분말의 제조로 산소와 탄소의 함량이 오히려 감소되는것의 구체적인 기구는 아직 확인되지 않았으나 플라즈마 고열에 의한 정련현상에 기인하는 것으로 생각된다.

The aim of this paper is to compare the characteristics of the T-P removal from synthesized municipal wastewater by electro-coagulation using cylindrical Al and Fe electrode as anode. For this purpose, a concentric circle type electrolysis reactor was used and the operating conditions for T-P removal from synthesized wastewater are as follows; potential 10 V, electrolyte 0.03% NaCl, initial T-P concentration 1.0 ~ 6.0 mg/L and flow rate 1.0 ~ 5.0 L/min. From the experimental results, T-P concentration of treated wastewater was decreased to less than 0.2 mg/L enough to discharge standard and Al electrode showed performance than Fe electrode for T-P removal by electro-coagulation. Optimal conditions for T-P removal to less than 0.15 mg/L which is 75% of discharge standard for large scale municipal wastewater plant (capacity higher than 500 m3/day) were obtained as follows; flow rate 2.503 L/min, and 2.337 L/min, HRT 1.059 min, 1.134 min, for Al and Fe electrode, respectively. Consumed mass of Al and Fe were of 3.76 times and 8.90 times respectively, were obtained to removed T-P at optimal conditions with potential 10 V, and 0.03% NaCl as electrolyte.