HF purification performance of an ion exchange membrane(IEM) was evaluated with 0.5% HF spiked with 10ppb of Fe, Ni and Cu nitrates. The result show that after less than five turnovers through an IEM, the metallic impurity concentration drops below 1ppb. The decrease rate can be fitted to a model assuming the experimental tanks to be continuously stirred tank reaction and that the metallic impurity concentration after the IEM is a function of the single-pass purification efficiency of the membrane, the concentration before purification and the metals desorbed form the IEM. The Concentration after purification was investigated up to a cumulative Fe loading of 300ppb in the 23 liter recirculated loop. It increases linearly vs. cumulative loading and can be explained by the Langmuir theory resulting in a purification efficiency at the equilibrium of close to 99.5% in this loading regime.

We used Cu as a representative of metals to be directly adsorbed on the bare Si surface and studied its removal DHF, DHF-H2O2 and BHF solution. It has been found that Cu ion in DHF adheres on every Si wafer surface that we used in our study (n, p, n+, p+) especially on the n+-Si surface. The DHF-H2O2 solution is found to be effective in removing metals featuring high electronegativity such as Cu from the p-Si and n-Si wafers. Even when the DHF-H2O2 solution has Cu ions at the concentration of 1ppm, the solution is found effective in cleaning the wafer. In the case the n+-Si and p+-Si wafers, however, their surfaces get contaminated with Cu When Cu ion of 10ppb remains in the DHF-H2O2 solution. When BHF is used, Cu in BHF is more likely to contaminate the n+-Si wafer. It is also revealed that the surfactant added to BHF improve wettability onto p-Si, n-Si and p+-Si wafer surface. This effect of the surfactant, however, is not observed on the n+-Si wafer and is increased when it is immersed in the DHF-H2O2 solution for 10min. The rate of the metallic contamination on the n+-Si wafer is found to be much higher than on the other Si wafers. In order to suppress the metallic contamination on every type of Si surface below 1010atoms/cm2, the metallic concentration in ultra pure water and high-purity DHF which is employed at the final stage of the cleaning process must be lowered below the part per trillion level. The DHF-H2O2 solution, however, degrades surface roughness on the substrate with the n+ and p+ surfaces. In order to remove metallic impurities on these surfaces, there is no choice at present but to use the NH4OH-H2O2-H2O and HCl-H2O2-H2O cleaning.

α-sulfonated fatty acid polyethylene glycol esters with polyethylene oxide(addition, 3, 5, 10mol) were synthesized through esterification of α-sulfonated fatty acid methyl esters with alkyl chain length C12~C18. Their compounds were separated with column chromatography, and confirmed by TLC. Quantitative analysis of all the sulfonates were performed according to JIS K-3362 method, and ethylene oxide unit number were determined by ISO 2270 method. Structural properties of α-sulfonated fatty acid methyl esters and their derivatives were also identified from IR, and 1H NMR spectra.

All the surface activities including surface tension, foaming power, foam stability, emulsifying power, dispersion effect, and detergency were measured and critical micelle concentration(cmc) was evaluated in dilute aqueous solution. The cmc evaluated by the Ring method was 10-3~10-4mol/L in case of monoesters, and 10-3~5.0×10-5mol/L in case of diesters, respectively. Surface tension of the aqueous solution was decreased to 45~50dyne/cm, showing the tendency that the ability of lowering the surface tension was dependent on increasing of carbon atom number in alkyl chain. Foaming power of all the monoesters was better than that of diesters. while foam stability of diesters was to the contrary. Emulsifying power of soybean oil or benzene was specially expected to be good for emulsifiers in industrial application fields. HLB values of monoesters and diesters evaluated by Griffin's method were in the range of 8 to 12. Dispersion property of ferric oxide was stable in the range of 4.5×10-5~5.0×-4mol/L in case of monoesters, and 10-5~10-4mol/L in case of diesters.