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        검색결과 7

        1.
        2003.09 KCI 등재 구독 인증기관 무료, 개인회원 유료
        In this study, we synthesized p-hexyloxybenzaldehyde(HBA) by using p-hydroxybenzaldehyde and n-hexylchloride. p-dodecylaniline(DDA) prepared by nitration and reduction of dodecylbenzene. The schiff base, p-dodecylbenzylidene-p'-hexyloxyaniline (DBHA) was synthesized by reaction of HBA and DDA. The color of synthetic compound was pale-brown and the yield was 62%. All the synthetic compounds were identified by TLC, FT-IR and iH-NMR.In this study, we synthesized p-hexyloxybenzaldehyde(HBA) by using p-hydroxybenzaldehyde and n-hexylchloride. p-dodecylaniline(DDA) prepared by nitration and reduction of dodecylbenzene. The schiff base, p-dodecylbenzylidene-p'-hexyloxyaniline(DBHA) was synthesized by reaction of HBA and DDA. The color of synthetic compound was pale-brown and the yield was 62%. All the synthetic compounds were identified by TLC, FT-IR and 1H-NMR.
        4,000원
        2.
        2003.06 KCI 등재 구독 인증기관 무료, 개인회원 유료
        Silver nanoparticles was synthesized by the method of W/O microemulsions with AOT (bis(2-ethylhexyl) sodium sulfosuccinate). The nucleation particle growth and aggregation was controlled by the droplet exchange process. The intermicellar exchange reaction is varied by changing the AOT and the H2O concentration. The synthesized W/O microemulsions was found to give the nanoparticles, which was confirmed by SEM, TEM, particle-size-analyzer, and UV-spectrometer. The most stable particles was obtained at 0.056 mole AOT solution, and the particle size distribution was found in the range from 27 to 31 nm. The mean particle size was reduced by adding Tween 20 significantly, and distribution was found from 14 to 16 nm. And, It's size was reduced by cosurfactants as toluene and benzyl alcohol. In case of toluene and benzyl alcohol, the range of particle size was found 7~11 nm and 8~12 nm.
        4,000원
        3.
        2001.12 KCI 등재 구독 인증기관 무료, 개인회원 유료
        A proposed method of determining the composition of mixed micelles in equilibrium with monomer of known composition is described. The systems were sodium α-sulfonated dodecanoyl ethyl esther (α-SR12Et) or sodium dodecyl sulfate(SDS)-polyoxyethylene 23 lauryl ether (Brij 35) un water and in 0.1M sodium chloride solution at 25℃. This technique applies the Gibbs-Duhem equation to the mixed micelles, which is treated as a pseudophase. This proposed methodology, which needs only critical micelle concentration data as a function of monomer composition, is applied to an anionic/nonionic surfactant pair. The calculated monomer-micelle equilibrium is found to be very similar to the much-used regular solution for nonideal systems.
        4,000원
        4.
        2001.03 KCI 등재 구독 인증기관 무료, 개인회원 유료
        These N-acyl amino acid surfactants is normally produced by reaction of acid anhydride with sodium l-glutamate hydrolysates under Schotten-Baumann condition i.e., in alkaline aqueous medium. To avoid using fatty acid chlorides, acylations were also carried out with the fatty acids themselves or with their methyl esters, but unfortunately these methods cannot be used in practice, dodecenyl succinic anhydride, was to be studied for their suitability as acylating agents the production if acylated glutamine hydrolysates. The surface activities including surface tension forming power, forming stability and emulsifying power were measured. The experimental results revealed that the products have a good emulsifying power. Thus, there derivatives will be expected to be used an emulsifying agent for O/W type cosmetic emulsion.
        4,000원
        5.
        2000.06 KCI 등재 구독 인증기관 무료, 개인회원 유료
        Physical properties and performance characteristics of sodium salt of several pure N-acyl amino acids made from glycine, dl-alanine, sarcosine, dl-valine, l-leucine, l-aspartic acid and l-lysine seven long chain fatty acids are reported. The effect of acyl chain length and the differences in the structure of constituent amino acid of seven homologous series of amide intermediate linked carboxylate surfactant of this class on the properties are discussed.
        4,000원
        6.
        2000.06 KCI 등재 구독 인증기관 무료, 개인회원 유료
        Sodium N-acyl N-methyl taurates were synthesized by effectual acylation of fatty acid ethyl esters C(C12~C18) and N-methyl taurine. All the surface activities including krafft point, solubility, interface tension, foaming power, lime-soap dispersing ability and detergency were measured, and cmc was evaluated in dilute aqueous solution.
        4,000원
        7.
        1999.03 KCI 등재 구독 인증기관 무료, 개인회원 유료
        We used Cu as a representative of metals to be directly adsorbed on the bare Si surface and studied its removal DHF, DHF-H2O2 and BHF solution. It has been found that Cu ion in DHF adheres on every Si wafer surface that we used in our study (n, p, n+, p+) especially on the n+-Si surface. The DHF-H2O2 solution is found to be effective in removing metals featuring high electronegativity such as Cu from the p-Si and n-Si wafers. Even when the DHF-H2O2 solution has Cu ions at the concentration of 1ppm, the solution is found effective in cleaning the wafer. In the case the n+-Si and p+-Si wafers, however, their surfaces get contaminated with Cu When Cu ion of 10ppb remains in the DHF-H2O2 solution. When BHF is used, Cu in BHF is more likely to contaminate the n+-Si wafer. It is also revealed that the surfactant added to BHF improve wettability onto p-Si, n-Si and p+-Si wafer surface. This effect of the surfactant, however, is not observed on the n+-Si wafer and is increased when it is immersed in the DHF-H2O2 solution for 10min. The rate of the metallic contamination on the n+-Si wafer is found to be much higher than on the other Si wafers. In order to suppress the metallic contamination on every type of Si surface below 1010atoms/cm2, the metallic concentration in ultra pure water and high-purity DHF which is employed at the final stage of the cleaning process must be lowered below the part per trillion level. The DHF-H2O2 solution, however, degrades surface roughness on the substrate with the n+ and p+ surfaces. In order to remove metallic impurities on these surfaces, there is no choice at present but to use the NH4OH-H2O2-H2O and HCl-H2O2-H2O cleaning.
        4,000원