We investigate the characteristics of self-assembled quantum dot infrared photodetectors(QDIPs) based on doping level. Two kinds of QDIP samples are prepared using molecular beam epitaxy : n+-i(QD)-n+ QDIP with undoped quantum dot(QD) active region and n+-n−(QD)-n+ QDIP containing Si direct doped QDs. InAs QDIPs were grown on semi-insulating GaAs (100) wafers by molecular-beam epitaxy. Both top and bottom contact GaAs layer are Si doped at 2×1018/cm3. The QD layers are grown by two-monolayer of InAs deposition and capped by InGaAs layer. For the n+-n−(QD)-n+ structure, Si dopant is directly doped in InAs QD at 2×1017/cm3. Undoped and doped QDIPs show a photoresponse peak at about 8.3 μm, ranging from 6~10 μm at 10 K. The intensity of the doped QDIP photoresponse is higher than that of the undoped QDIP on same temperature. Undoped QDIP yields a photoresponse of up to 50 K, whereas doped QDIP has a response of up to 30 K only. This result suggests that the doping level of QDs should be appropriately determined by compromising between photoresponsivity and operating temperature.

We report the properties of infrared photodetectors based on two kinds of quantum dots(QDs): i) 2.0 ML InAs QDs by the Stranski-Krastanov growth mode(SK QDs) and ii) sub-monolayer QDs by 4 × [0.3 ML/1 nm In0.15Ga0.85As] deposition(SML QDs). The QD infrared photodetector(QDIP) structure of n+-n−(QDs)-n+ is epitaxially grown on GaAs (100) wafers using molecular-beam epitaxy. Both the bottom and top contact GaAs layers are Si doped at 2 × 1018/cm3. The QD layers are grown with Si doping of 2 × 1017/cm3 and capped by an In0.15Ga0.85As layer at 495 oC. The photoluminescence peak(1.24 eV) of the SML QDIP is blue-shifted with respect to that (1.04 eV) of SK QDIPs, suggesting that the electron ground state of SML QDIP is higher than that of the SK QDIP. As a result, the photoresponse regime(~9-14 μm) of the SML QDIP is longer than that (~6-12 μm) of the SK QDIP. The dark current of the SML QDIP is two orders of magnitude smaller value than that of the SK QDIP because of the inserted Al0.08Ga0.92As layer.

In this paper, the gait parameter detection system using an infrared rays elements was developed. This system consist of the transmission unit and receiver of an infrared LED light and the gait parameter were calculated by the non-transmission timing of infrared LED light from user’s leg movement Based on this method, we calculated the velocity of gait and gait stride of the person during the gait motion on the treadmill. To confirm the effectiveness of this system, we analyzed the real velocity of the treadmill using tachometer on treadmill compared with controlled velocity of treadmill.

We have built a near-infrared imaging camera with a PtSi array detector manufactured by the Mitsubishi Company. The PtSi detector is sensitive in the wavelength range 1 to 5μm 5μm . Quantum efficiency of PtSi is much lower than that of InSb and HgCdTe types. However, the PtSi array has advantages over the latter ones: (i)The read-out noise is very low; (ii)the characteristics of the array elements arc uniform and stable; (iii)it is not difficult to make a large PtSi array; and (iv) consequently the price is affordably low. The array used consists of 512×512 512×512 pixels and its size is 10.2mm×13.3mm 10.2mm×13.3mm . The filter wheel of the camera is equipped with J, H, K filters, and an aluminum plate for measuring the dark noise. The dewar is cooled with liquid nitrogen. We have adopted a method of installing the clock pattern and the observing softwares in the RAM, which Gill he easily used for other systems. We have developed a software with a pull-down menu for operating the camera and data acquisition. The camera has been tested by observing δ δ Orionis.