Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

This study was conducted to investigate optimum processing procedure of fresh-cut button mushrooms. The experiments were done with different processing parameters including washing method, washing time, sanitation, and cutting time. Fresh mushrooms were washed by swirling water (SW), lift type-immersion washing (LIW), or combined LIW and water spray (LI+WS). Mushroom samples were washed by LIW for 0, 1, 3, and 5 minutes separately. Mushrooms were sanitized with 0, 50, or 100 ㎕L-1 chlorine solution (pH 7) for 60 seconds. Mushrooms were sliced at different times (before washing, after washing, or after drying). The combined washing treatment, LIW+WS was effective in maintaining better appearance and higher Lightness color value among treatments. Optimum washing time to remove foreign materials and maintain color was 3 minutes when mushrooms were washed by LIW. Samples sanitized with 50 ㎕L-1 chlorine reduced initial aerobic bacterial population and had only slight residual chlorine odor. Fresh-cut mushrooms sliced after washing had the lowest loss among samples. The optimized washing, sanitation, and cutting time parameters can be used for sequential processing of fresh-cut button mushrooms.

프로판(C3H8)을 반응가스로 사용하여 등온 저압화학기상침투법(low-pressure chemical vapor infiltration)으로 탄소/탄소 복합재료를 치밀화 할 때 반응온도, 반응가스농도, 가스유량, 반응압력 등의 제조공정변수들이 치밀화에 미치는 영향을 알아보기 위하여 실험계획법(Rdbust design method)에 의한 실험을 행하였다. 1회의 등온 저압화학기상침투 실험으로 탄소/탄소 복합재료의 부피 밀도와 표면과 내부의 부피 밀도의 차이를 특성치(characteristic value)로 한 실험계획법의 분산분석(analysis of variance)에 의하면 반응온도, 반응가스농도, 가스유량 등의 제고공정변수가 치밀화에 기여도가 높으며, 반응압력의 기여도와 제조공정변수들의 교호작용(interaction)에 의한 기여도는 낮은 것으로 나타났다. 반응온도가 1100˚C, 반응가스농도가 100% C3H8, 가스유량이 100 SCCM, 반응압력이 5torr인 조건에서 탄소/탄소 복합재료는 가장 높은 부피 밀도값을 나타내었으나 시편의 표면과 내부의 부피 밀도 차이값은 컸다.