고분자 분리막의 대표적인 형태 중 하나인 평판형 분리막은 제조가 용이하여 실험실에서 분리막 소재 연구에서부 터 실제 상용 분리막 생산에 이르기까지 널리 활용되는 분리막의 형태이다. 정밀여과 및 한외여과 등에 사용되는 평판형의 다공성 고분자 분리막은 주로 상분리 공정을 통해 제조할 수 있으며, 여기에는 비용매 유도 및 증기 유도 상분리 공정이 활 용된다. 그러나 상분리 공정 특성상 주변 환경과 실험자에 따라 샘플 간 편차가 쉽게 발생하여 재현성의 확보가 어려운 점이 있다. 따라서 개발된 제조기술을 스케일업 및 재현성 확보를 위해 제어된 환경에서 연속식 대면적 제조가 가능한 롤투롤 제 조장치가 필요하며, 본 연구에서는 실험실 스케일의 제조기술을 나이프 및 슬롯다이 롤투롤 공정으로 스케일 업 했을 때 나 타나는 제조 환경 차이에 따른 분리막의 특성 변화를 비교하였다. 최종적으로 연속식 제조공정 인자에 대한 최적화를 통해 대면적 제조 시 분리막의 균일성을 확보하였다.

수소를 연료로 사용하는 PEMFC는 고효율⋅출력밀도를 나타내며, 짧은 시동시간, 우수한 응답특성에 따라 현지설치형 발전기술로 사용되며, 이를 위한 고효율 연료처리장치가 필수적이다. SMR반응은 연료당 고회수율을 때문에 경제성이 우수하며, 전환율 확보를 위해 700°C, 20 bar 이상의 운전조건에서 수행되며, WGS, PSA의 후단공정을 통해 수소를 생산한다. 분리막 개질기를 이용한 SMR반응은 분리막이 수소를 제거함에 따라 반응효율 증진, 공정온도 저감, 후단공정 배제를 할 수 있어 공정구성 및 경제성이 우수하다. 본 연구에서는 팔라듐분리막 개질기를 사용하여 550°C, 5 bar에서 SMR반응을 통해 수소를 생산하였으며, 개질된 가스의 CO 농도를 최소화하여 고온 PEMFC용 연료처리장치를 개발하였다.

When taking X-ray, Some of them are not only absorbed as they pass through the body, but some are scattered and blurred. To prevent this problem, 'X-Ray Grid' was placed between the body and the film. Conventionally, in order to manufacture an X-ray grid, a lead sheet and an aluminum sheet were adhered with epoxy or the like, cut to a predetermined thickness, and formed in a line at a predetermined angle. New grids are actively being developed to solve this problem. In this study, Laser beam was irradiated on a photosensitive glass having high X-ray transmittance to form an oblique lattice type channel. When the photosensitive glass is exposed to Laser beam, Previous studies have shown that laser exposure to photosensitive glass reacts with UV-Laserto form high-precision microstructures. The photosensitive glass exposed by the laser is heat-treated at a high temperature to crystallize the exposed part. When the crystallized patterns are etched with a hydrofluoric acid liquid solution, a structure having a depth is completed. The completed structure is filled with metals with X-ray shielding properties. The angle of incidence can be processed up to 18, which is the angle of incidence of ordinary X-ray, The upper surface line width of theetched pattern is 20um or less and The depth of processing after etching was found to be more than 100um, which means 'the filler can be deposited sufficiently'.

Graphene-based derivatives such as graphene oxide(GO) have great potential as membrane material due to their controllable d-spacing, extremely large surface area and tunability of multifunctional groups. GO, highly oxidized graphene, has especially good affinity to CO2 arose from its oxide functional groups(e.g. carboxylic acid, hydroxyl groups) on 2-D nanosheet plane. Here, we synthesized GO/polymer composite materials and fabricated large-area thin film composite(TFC) membrane for CO2 separation using polymeric porous support. Further, we have produced flat-sheet membrane modules with the TFC membranes and tested the performance of the module under CO2/N2 mixed gas and flue gas conditions. The membrane module exhibited high CO2 separation performance as 74% of purity and 22% of recovery under flue gas condition including CO2, O2 and N2.

Fecralloy coating layer with large surface area is suitable for use as a filter media for efficient removal of hot gaseous pollutants exhausted from combustion processes. For uniform preparation of a Fecralloy coating layer with large surface area and strong adhesion to substrate, electrospray coating and thermal treatment processes are experimentally optimized in this study. A nano-colloidal solution with 0.05 wt% Fecralloy nanoparticles is successfully prepared. Optimized electrospraying conditions are experimentally discovered to prepare a uniform coating layer of Fecralloy nanocolloidal solution on a substrate. Drying the electrospray coated Fecralloy nano-colloidal solution layer at 120oC and subsequent heating at 600oC are the best post-treatment for enhancing the adhesion force and surface roughness of the Fecralloy coating layer on a substrate. An electrospray coating system, consisting of several multi-groove nozzles, is also experimentally confirmed as a reasonable device for uniform coating of Fecralloy nano-colloid on a large area substrate

Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.

Cu2O nanowires were synthesized at large scale on copper plate by thermal oxidation in air. The effect of oxidation time and temperature on the morphology of the nanowires was examined. The oxidation time had no effect on the diameter of the nanowires, while it had a great effect on the density and the length of the nanowires. The density and the length of the nanowires increased, and then decreased, with increasing oxidation time. The oxidation temperature had a tremendous effect on the size-distribution as well as the density of the nanowires. When the oxidation temperature was 700˚C, uniform size-distribution and high density of the nanowires was achieved. At lower and higher temperatures, the density of the nanowires was lower, and they displayed a broader size-distribution. It is suggested that the Cu2O nanowires were grown via a vapor-solid mechanism because no catalyst particles were observed at the tips of the nanowires.

Large single grain Gd1.5Ba2Cu3O7-y (Gd1.5) bulk superconductors were fabricated by a top-seeded melt growth (TSMG) process using an NdBa2Cu3O7-y seed. The seeded Gd1.5 powder compacts with a diameter of 50 mm were subjected to the heating cycles of a TSMG process. After the TSMG process, the diameter of the single grain Gd1.5 compact was reduced to 43 mm owing to the volume contraction during the heat treatment. The superconducting transition temperature (Tc) of the top surface of the single grain Gd1.5 sample was as high as 93.5 K. The critical current densities (Jcs) at 77 K and 1T and 1.5 T were in ranges of 25,200-43,900 A/cm2 and 10,000-23,000 A/cm2, respectively. The maximum attractive force at 77 K of the sample field-cooled using an Nd-B-Fe permanent magnet (surface magnetic field of 0. 527 T) was 108.3 N; the maximum repulsive force of the zero field-cooled sample was 262 N. The magnetic flux density of the sample field-cooled at 77 K was 0.311T, which is approximately 85% of the applied magnetic field of 0.375 T. Microstructure investigation showed that many Gd2BaCuO5 (Gd211) particles of a few μm in size, which are flux pinning sites of Gd123, were trapped within the GdBa2Cu3O7-y (Gd123) grain; unreacted Ba3Cu5O8 liquid and Gd211 particles were present near the edge regions of the single grain Gd1.5 bulk compact.

Sintered bulks of nanopowders were fabricated by magnetic pulsed compaction (MPC) and subsequent two-step sintering employed in this study and the formability effects of nanopowder on mixing condition, pressure and sintering temperature were investigated. The addition of PVA induced and increase in the formability of the sintered bulk. But cracked bulks were obtained on sintering with addition of over 10 wt% PVA due to generation of crack during sintering. The optimum compaction pressure during MPC was 1.0 GPa and mixing conditions included using 5.0 wt% PVA. The optimum processing condition included MPC process, followed by two-step sintering (first at 1000 and then at ). The sintered bulks with the diameter of 30 mm under these conditions were found to have non crack, ~99% density.

Multi-source evaporation is one of the methods to improve the thickness uniformity of thin films deposited by evaporation. In this study, a simulator for the relative thickness profile of a thin film deposited by a multi-source evaporation system was developed. Using this simulator, the relative thickness profiles of the evaporated thin films were simulated under various conditions, such as the number and arrangements of sources and source-to-substrate distance. The optimum conditions, in which the thickness uniformity is minimized, and the corresponding efficiency, were obtained. The substrate was a 5th generation substrate (dimensions of 1300 mm × 1100 mm). The number of sources and source-to-substrate distance were varied from 1 to 6 and 0 to the length of the major axis of the substrate (1300 mm), respectively. When the source plane, the area on which sources can be located, is limited to the substrate dimension, the minimum thickness uniformity, obtained when the number of sources is 6, was 3.3%; the corresponding efficiency was 16.6%. When the dimension of the source plane is enlarged two times, the thickness uniformity is remarkably improved while the efficiency is decreased. The minimum thickness uniformity, obtained when the number of sources is 6, was 0.5%; the corresponding efficiency was decreased to 9.1%. The expansion of the source plane brings about not only the improvement of the thickness uniformity, but also a decrement of the efficiency and an enlargement of equipment.

This paper describes an improved strategy for controlling the adhesion force using both the antiadhesion and adhesion layers for a successful large-area transfer process. An MPTMS (3-mercaptopropyltrimethoxysilane) monolayer as an adhesion layer for Au/Pd thin films was deposited on Si substrates by vapor self assembly monolayer (VSAM) method. Contact angle, surface energy, film thickness, friction force, and roughness were considered for finding the optimized conditions. The sputtered Au/Pd (~17 nm) layer on the PDMS stamp without the anti-adhesion layer showed poor transfer results due to the high adhesion between sputtered Au/Pd and PDMS. In order to reduce the adhesion between Au/Pd and PDMS, an anti-adhesion monolayer was coated on the PDMS stamp using FOTS (perfluorooctyltrichlorosilane) after O2 plasma treatment. The transfer process with the anti-adhesion layer gave good transfer results over a large area (20 mm × 20 mm) without pattern loss or distortion. To investigate the applied pressure effect, the PDMS stamp was sandwiched after 90˚ rotation on the MPTMS-coated patterned Si substrate with 1-μm depth. The sputtered Au/Pd was transferred onto the contact area, making square metal patterns on the top of the patterned Si structures. Applying low pressure helped to remove voids and to make conformal contact; however, high pressure yielded irregular transfer results due to PDMS stamp deformation. One of key parameters to success of this transfer process is the controllability of the adhesion force between the stamp and the target substrate. This technique offers high reliability during the transfer process, which suggests a potential building method for future functional structures.