고체전해질은 높은 에너지 밀도와 안전성을 갖춘 차세대 리튬이온전지에 꼭 필요한 핵심 요소다. 이러한 고체전 해질의 제작을 위해서 기존 고체전해질의 낮은 이온전도도와 높은 계면저항 문제를 해결해야 한다. 본 연구에서는 강화된 이 온 전도성과 계면 안정성을 지닌 PVDF-HFP 고분자에 분산된 Li7La3Zr2O12 (LLZO) 나노와이어 복합체를 기반으로 하는 새 로운 전해질(PVDF-HFP/LLZO/SN, PHLS membrane)을 제안한다. PHLS에 용매 열압착(Sovlent heat press, SHP)을 통해 계 면 저항과 내부 공극이 감소된 PHLS-(SHP)는 30°C에서 2.06 × 10-4 S/cm의 높은 이온 전도도, 4.5 V (vs. Li/Li+)의 넓은 전 기화학적 전위 창, 리튬 금속과 전해질 사이의 안정된 계면 안정성을 나타냈다. 0.2 mA/cm2에서 수행된 Li 대칭 셀을 사용한 전기화학적 테스트에서 150 시간 이상 안정성을 유지하는 것으로 확인되었으며, 이는 당사의 복합 기반 고체 전해질을 활용 하여 전기화학적 성능이 향상되었음을 시사한다.

Solar energy has been recognized as an alternative energy source that can help address fuel depletion and climate change issues. As a renewable energy alternative to fossil fuels, it is an eco-friendly and unlimited energy source. Among solar cells, thin film Cu2ZnSn(S,Se)4 (CZTSSe) is currently being actively studied as an alternative to heavily commercialized Cu (In,Ga)Se2 (CIGS) thin film solar cells, which rely upon costly and scarce indium and gallium. Currently, the highest efficiency achieved by CZTSSe cells is 14.9 %, lower than the CIGS record of 23.35 %. When applied to devices, CZTSSe thin films perform poorly compared to other materials due to problems including lattice defects, conduction band offset, secondary phase information, and narrow stable phase regions, so improving their performance is essential. Research into ways of improving performance by doping with Germanium and Cadmium is underway. Specifically, Ge can be doped into CZTSSe, replacing Sn to reduce pinholes and bulk recombination. Additionally, partially replacing Zn with Cd can facilitate grain growth and suppress secondary phase formation. In this study, we analyzed the device’s performance after doping Ge into CZTSSe thin film using evaporation, and doping Cd using chemical bath deposition. The Ge doped thin film showed a larger bandgap than the undoped reference thin film, achieving the highest Voc of 494 mV in the device. The Cd doped thin film showed a smaller bandgap than the undoped reference thin film, with the highest Jsc of 36.9 mA/cm2. As a result, the thin film solar cells achieved a power conversion efficiency of 10.84 %, representing a 20 % improvement in power conversion efficiency compared to the undoped reference device.

High-frequency soft magnetic Ni, Fe, and Co-based thin films have been developed, typically as nanocrystals and amorphous alloys. These Ni, Fe, and Co-based thin films exhibit remarkably good frequency dependence up to high frequencies of several tens of MHz. These properties arise from the moderate magnetic anisotropy and fairly high electrical resistivity that result from the microstructural characteristics of the nanocrystalline and amorphous states. In this paper, Al-Co/AlN-Co and Al-N/AlN-Co multilayer films were deposited using two-facing-target type sputtering (TFTS). Their microstructures, magnetic and electrical properties were studied with the expectation that inserting Al-Co or Al-N as an interlayer could effectively reduce the coercive force and produce films with relatively high resistivity. A new approach is presented for the fabrication of Al-Co (Al-N)/AlN-Co multilayer films, prepared with the TFTS system. The deposited films were isothermally annealed at different temperatures and investigated for microstructure, magnetic properties and resistivity. The TFTS method used in this experiment is suitable for fabricating Al-Co(Al-N)/AlN-Co multilayer films with different layer thickness ratio (LTR). The annealing conditions, thickness of the multilayer film, and LTR can control the physical properties as well as the microstructure of the manufactured film. Magnetization and resistance increased and coercivity decreased as LTR decreased. The thin film with LTR = 0.175 exhibited high resistivity values of 2,500 μΩ-cm, magnetization of 360 emu/cm3, and coercivity of 5 Oe. Results suggests that thin films with such good resistivity and magnetization would be useful as high-density recording materials.

Nano-oxide dispersion–strengthened (ODS) superalloys have attracted attention because of their outstanding mechanical reinforcement mechanism. Dispersed oxides increase the material’s strength by preventing grain growth and recrystallization, as well as increasing creep resistance. In this research, atomic layer deposition (ALD) was applied to synthesize an ODS alloy. It is useful to coat conformal thin films even on complex matrix shapes, such as nanorods or powders. We coated an Nb-Si–based superalloy with TiO2 thin film by using rotary-reactor type thermal ALD. TiO2 was grown by controlling the deposition recipe, reactor temperature, N2 flow rate, and rotor speed. We could confirm the formation of uniform TiO2 film on the surface of the superalloy. This process was successfully applied to the synthesis of an ODS alloy, which could be a new field of ALD applications.

해당 연구는 산업 폐수에서 염료를 효율적으로 제거하기 위한 고급 박막 나노복합체(TFN) 기반 나노여과막을 개 발하여 효과적인 폐수 처리 방법을 제시합니다. 최근 연구의 동향을 보면, 나노카본, 실리카 나노스피어, 금속-유기 프레임워 크(MOF) 및 MoS2와 같은 혁신적인 재료를 포함하는 TFN 막의 제조에 중점을 둡니다. 주요 목표는 염료 제거 효율을 향상 시키고 오염 방지 특성을 개선하며 염료/염 분리에 대한 높은 선택성을 유지하는 것입니다. 이 논문은 넓은 표면적, 기계적 견고성 및 특정 오염 물질 상호 작용 능력을 포함하여 이러한 나노 재료의 뚜렷한 이점을 활용하여 현재 나노여과 기술의 제 한을 극복하고 물 처리 문제에 대한 지속 가능한 솔루션을 제공하는 것을 목표로 합니다.

In this study, we undertook detailed experiments to increase hydrogen production efficiency by optimizing the thickness of titanium dioxide (TiO2) thin films. TiO2 films were deposited on p-type silicon (Si) wafers using atomic layer deposition (ALD) technology. The main goal was to identify the optimal thickness of TiO2 film that would maximize hydrogen production efficiency while maintaining stable operating conditions. The photoelectrochemical (PEC) properties of the TiO2 films of different thicknesses were evaluated using open circuit potential (OCP) and linear sweep voltammetry (LSV) analysis. These techniques play a pivotal role in evaluating the electrochemical behavior and photoactivity of semiconductor materials in PEC systems. Our results showed photovoltage tended to improve with increasing thickness of TiO2 deposition. However, this improvement was observed to plateau and eventually decline when the thickness exceeded 1.5 nm, showing a correlation between charge transfer efficiency and tunneling. On the other hand, LSV analysis showed bare Si had the greatest efficiency, and that the deposition of TiO2 caused a positive change in the formation of photovoltage, but was not optimal. We show that oxide tunneling-capable TiO2 film thicknesses of 1~2 nm have the potential to improve the efficiency of PEC hydrogen production systems. This study not only reveals the complex relationship between film thickness and PEC performance, but also enabled greater efficiency and set a benchmark for future research aimed at developing sustainable hydrogen production technologies.

As the limitations of Moore’s Law become evident, there has been growing interest in advanced packaging technologies. Among various 3D packaging techniques, Cu-SiO2 hybrid bonding has gained attention in heterogeneous devices. However, certain issues, such as its high-temperature processing conditions and copper oxidation, can affect electrical properties and mechanical reliability. Therefore, we studied depositing only a heterometal on top of the Cu in Cu-SiO2 composite substrates to prevent copper surface oxidation and to lower bonding process temperature. The heterometal needs to be deposited as an ultra-thin layer of less than 10 nm, for copper diffusion. We established the process conditions for depositing a Co film using a Co(EtCp)2 precursor and utilizing plasma-enhanced atomic layer deposition (PEALD), which allows for precise atomic level thickness control. In addition, we attempted to use a growth inhibitor by growing a self-assembled monolayer (SAM) material, octadecyltrichlorosilane (ODTS), on a SiO2 substrate to selectively suppress the growth of Co film. We compared the growth behavior of the Co film under various PEALD process conditions and examined their selectivity based on the ODTS growth time.

ZnO/Cu/ZnO (ZCZ) thin films were deposited at room temperature on a glass substrate using direct current (DC) and radio frequency (RF, 13.56 MHz) magnetron sputtering and then the effect of post-deposition electron irradiation on the structural, optical, electrical and transparent heater properties of the films were considered. ZCZ films that were electron beam irradiated at 500 eV showed an increase in the grain sizes of their ZnO(102) and (201) planes to 15.17 nm and 11.51 nm, respectively, from grain sizes of 13.50 nm and 10.60 nm observed in the as deposited films. In addition, the film’s optical and electrical properties also depended on the electron irradiation energies. The highest opto-electrical performance was observed in films electron irradiated at 500 eV. In a heat radiation test, when a bias voltage of 18 V was applied to the film that had been electron irradiated at 500 eV, its steady state temperature was about 90.5 °C. In a repetition test, it reached the steady state temperature within 60 s at all bias voltages.